AVS 64th International Symposium & Exhibition | |
Novel Trends in Synchrotron and FEL-Based Analysis Focus Topic | Wednesday Sessions |
Session SA+AS+HC+SS-WeA |
Session: | In Situ and Operando Characterization of Interfacial Reactions in Energy & Electronic Devices |
Presenter: | Zhi Liu, ShanghaiTech University, PR China |
Authors: | Z. Liu, ShanghaiTech University, PR China J. Cai, ShanghaiTech University, PR China Q. Liu, ShanghaiTech University, PR China Y. Han, Chinese Academy of Sciences, PR China J. Liu, ShanghaiTech University, PR China M. Mao, Chinese Academy of Sciences, PR China H. Zhang, Chinese Academy of Sciences, PR China Y. Li, ShanghaiTech University, PR China |
Correspondent: | Click to Email |
Multiple new ambient pressure x-ray photoelectron spectroscopy (AP-XPS) endstations are currently under planning or development at US and international synchrotron light sources. Most of the research has been focused on the solid-gas interfaces. [1] Recently we have installed a new hard x-ray AP-XPS endstation at ALS Beamline 9.3.1 (2.5keV- 5keV). By using X-ray up to 5KeV, we can perform AP-XPS at a pressure up to 110 torr. The probing depth of photoelectrons also increases to >10 nm, which will allow us to study not only the gas/solid interface but also the liquid/solid interface. [2] In this talk, I will present results of in-situ studies on the electrolyte/electrode interface of a working model electrochemical cell. I will also give a brief introduction on the APXPS development in Shanghai.
We believe the successful development of soft and hard X-ray APXPS techniques will provide us and community beyond a powerful in-situ tool to directly study interface phenomena at Solid-Gas and Solid-Liquid Interfaces.
References
1. D. E. Starr et.al, Chemical Society reviews 42, 5833-57 (2013).
2. S. Axnanda et. al, Scientific Reports, 5,9788 (2015).