| AVS 64th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS+AS-MoM1 Control of Plasma Doping Conformality in FinFET Arrays Mona Ebrish, O. Gluschenkov, IBM Research Division, M.J.P. Hopstaken, IBM T.J. Watson Research Center, F. Torregrosa, Ion Beam Services |
| 8:40am | PS+AS-MoM2 Study of Plasma-etching Parameter Impacts on Two-dimensional Electron Gas Degradation in AlGaN/GaN Heterostructures Frédéric Le Roux, P. Burtin, N. Possémé, A. Torres, S. Barnola, CEA-Leti, France |
| 9:00am | PS+AS-MoM3 Invited Paper Spatiotemporal Non-uniformity of CVD Plasmas and Film Qualities Masaharu Shiratani, Kyushu University, Japan |
| 9:40am | PS+AS-MoM5 Surface-driven CH4 generation from CO2 in Low-pressure Non-thermal Plasma Kazunori Koga, S. Toko, S. Tanida, M. Shiratani, Kyushu University, Japan |
| 10:00am | PS+AS-MoM6 Plasma Modification of Carbon Fibres for Tough Carbon Fibre Composites Sally McArthur, R. Radjef, BL. Fox, Swinburne University of Technology, Australia |
| 10:40am | PS+AS-MoM8 Invited Paper Damage Free Plasma Etching Processes of III-V Semiconductors for Microelectronic and Photonic Applications Erwine Pargon, M. Bizouerne, C. Petit-Etienne, L. Vallier, G. Gay, M. Fahed, K. Rovayaz, M. Fouchier, C. Bellegarde, V. Renaud, G. Cunge, O. Joubert, CNRS-LTM, Université Grenoble Alpes, France, E. Martinez, N. Rochat, CEA-Leti, France |
| 11:20am | PS+AS-MoM10 Fabrication of Metal Nanoparticle-dispersed Nanocomposite Films by In Situ Plasma Reduction of Metal Cation-containing Polymer Films D.R. Boris, Naval Research Laboratory, Souvik Ghosh, Case Western Reserve University, S.C. Hernandez, Naval Research Laboratory, C.A. Zorman, Case Western Reserve University, S.G. Walton, Naval Research Laboratory, R.M. Sankaran, Case Western Reserve University |