AVS 64th International Symposium & Exhibition | |
Plasma Science and Technology Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:20am | PS+AS+SE-MoM1 Study of Atmospheric-pressure kHz Multi-jet Plasma System Vladimir Milosavljevic, J. Lalor, L. Scally, P.J. Cullen, Dublin Institute of Technology, Ireland |
8:40am | PS+AS+SE-MoM2 Synthesis of Nitrates by Atmospheric Microplasma Over Water : Effect of the Experimental Parameters and Intermediate Species Nicolas Maira, C. De Vos, F. Reniers, Université Libre de Bruxelles, Belgium |
9:00am | PS+AS+SE-MoM3 Plasma Catalysis for CO2 and CH4 Conversion at Atmospheric Pressure A. Ozkan, S. Chorfi, L. Brune, T. Visart de Bocarmé, François Reniers, Université Libre de Bruxelles, Belgium |
9:20am | PS+AS+SE-MoM4 Aluminium Surface Plasma Treatment at Atmosphere Pressure Lucia Bonova, I.A. Shchelkanov, C. Ahn, S. Chaudhuri, D.N. Ruzic, University of Illinois at Urbana-Champaign |
9:40am | PS+AS+SE-MoM5 Invited Paper The Role of Bulk Liquid Transport Processes in the Plasma-Liquid Interfacial Chemistry Selma Mededovic Thagard, M. Vasilev, D. Bohl, P. Conlon, Clarkson University |
10:40am | PS+AS+SE-MoM8 Efficiency of Electrolytic Reduction of Aqueous Metal Salts to Metal Nanoparticles at a Plasma-Liquid Interface S. Ghosh, Ryan Hawtof, Case Western Reserve University, P. Rumbach, D.B. Go, University of Notre Dame, R. Akolkar, R.M. Sankaran, Case Western Reserve University |
11:20am | PS+AS+SE-MoM10 Invited Paper Amorphous Indium Zinc Oxide (IZO) Semiconductor Films Grown by Atmospheric Plasma-Enhanced Spatial ALD for Application as High-Mobility Channel in Thin Film Transistors A. Illiberi, I. Katsouras, S. Gazibegović, B. Cobb, E. Nekovic, TNO-Holst Centre, Netherlands, W. van Boekel, C. Frijters, TNO-Solliance, Netherlands, J. Maas, TNO-Holst Centre, Netherlands, Fred Roozeboom, TNO-Holst Centre & Eindhoven University of Technology, Netherlands, Y.L.M. Creyghton, TNO-Solliance, Netherlands, P. Poodt, TNO-Holst Centre, Netherlands, G. Gelinck, TNO-Holst Centre & Eindhoven University of Technology, Netherlands |