AVS 64th International Symposium & Exhibition
    Advanced Ion Microscopy Focus Topic Thursday Sessions

Session HI+NS+TR-ThA
Novel Beam Induced Surface Analysis and Nano-Patterning

Thursday, November 2, 2017, 2:20 pm, Room 7 & 8
Moderators: Anne Delobbe, Orsay Physics, Shinichi Ogawa, National Institute of Advanced Industrial Science and Technology (AIST)


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Click a paper to see the details. Presenters are shown in bold type.

2:20pm HI+NS+TR-ThA1 Invited Paper
Multimodal Chemical Imaging of Nanoscale Interfacial Phenomena on a Combined HIM-SIMS Platform
Olga Ovchinnikova, Oak Ridge National Laboratory
3:00pm HI+NS+TR-ThA3
Characterizing Surface Immobilized Antibodies using ToF-SIMS and Multivariate Analysis
N.G. Welch, CSIRO Manufacturing, Australia, R.M.T. Madiona, La Trobe University, Australia, J.A. Scoble, B.W. Muir, CSIRO Manufacturing, Australia, Paul Pigram, La Trobe University, Australia
4:00pm HI+NS+TR-ThA6 Invited Paper
Single-nanometer Functional Graphene Devices Patterned with Helium Ion Beam
Hiroshi Mizuta, M.E. Schmidt, T. Kanzaki, Japan Advanced Institute of Science and Technology (JAIST), Japan, S. Ogawa, National Institute of Advanced Industrial Science and Technology (AIST), Japan, M. Muruganathan, Japan Advanced Institute of Science and Technology (JAIST), Japan
5:00pm HI+NS+TR-ThA9
Monte Carlo Simulation Study of Gas Assisted Focused Ion Beam Induced Etching
Kyle Mahady, P.D. Rack, University of Tennessee, S. Tan, Intel Corporation, Y. Greenzweig, Intel Corporation, Israel, R.H. Livengood, Intel Corporation, A. Raveh, Intel Corporation, Israel
5:20pm HI+NS+TR-ThA10
Direct Write of Complex 3-Dimensional Structures with Helium Ion Microscopy
Matthew Burch, A.V. Ievlev, Oak Ridge National Laboratory, M.G. Stanford, B. Lewis, University of Tennessee, X. Sang, S. Kim, J. Fowlkes, Oak Ridge National Laboratory, P.D. Rack, University of Tennessee, R.R. Unocic, A. Belianinov, O.S. Ovchinikova, Oak Ridge National Laboratory