| AVS 64th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Tuesday Sessions |
| Session PS+SS-TuA |
| Session: | The Science of Plasmas and Surfaces: Commemorating the Career of Harold Winters (ALL INVITED SESSION) |
| Presenter: | Mark Kushner, University of Michigan |
| Authors: | M.J. Kushner, University of Michigan C.M. Huard, University of Michigan S.J. Lanham, University of Michigan S. Huang, University of Michigan P. Tian, University of Michigan |
| Correspondent: | Click to Email |
A hallmark of the contributions of Harold Winters to the advancement of plasma materials processing is beginning with fundamental processes, and building upon this foundational knowledge towards technology development. His contributions to our understanding of ion assisted chemical sputtering, adsorption, desorption, chemisorption, conductance in features, stopping distances, mixing layers and electron impact dissociation cross sections are examples of producing foundational knowledge which enabled the work of colleagues in the field. This enabling aspect of his work is nowhere more true than for modeling and simulation, as first principles models begin with these foundational principles. In this talk, key foundational contributions by Harold Winters in plasma-surface interactions and electron impact processes will be reviewed from the perspective of enabling first principles modeling. Examples will be discussed from reactor and feature scale modeling of conductor and dielectric plasma etching, with emphasis on aspect ratio dependent etching and atomic layer etching.
Work was supported by National Science Foundation, Department of Energy Office of Fusion Energy Science, Lam Research and Samsung Electronics.