AVS 64th International Symposium & Exhibition | |
Plasma Science and Technology Division | Wednesday Sessions |
Session PS+NS+SS-WeM |
Session: | Plasma Processing for Nanomaterials & Nanoparticles |
Presenter: | Necip Berker Uner, Washington University in St. Louis |
Authors: | N.B. Uner, Washington University in St. Louis E. Thimsen, Washington University in St. Louis |
Correspondent: | Click to Email |
Particle nucleation is a major problem that occurs in many thin film processing plasmas. The resultant “killer particles” can create defects upon deposition on the film and they can consequently decrease device functionality. A change of perspective, within the last two decades, the aptness of low temperature plasmas (LTP) for particle nucleation has been successfully exploited to synthesize monodisperse, free standing, spherical and crystalline semiconductor nanocrystals from vapor precursors. These impressive properties of particles synthesized in LTPs stem from particle charging and ion bombardment. When the particle number density is smaller than the ion density, it is proposed that the particles experience unipolar charging. The negative charge acquired by the particles suppresses coagulation and leads to uniform growth. On the other hand, ion bombardment elevates particle temperatures above the surrounding gas temperature and provides crystallinity. By using LTPs, nanocrystals of silicon, germanium, various oxides, sulfides and compound semiconductors of high quality have been produced, whereas production of metal particles were less successful, which indicates incomplete understanding.
In this study, we focus on the interaction between the plasma and metal nanoparticles. In an environment free of vapor precursors, we demonstrate that particle growth in LTPs follows a reversible path. Instead of continuous growth, ion bombardment can lead to extensive vaporization, depending on the plasma density and vapor pressure. By sending in a premade aerosol of bismuth particles through a capacitively coupled radio frequency argon plasma, we observed complete vaporization of the metal at moderate power inputs. Interestingly, at low power inputs, vaporization resulted in significant restructuring of the particle size distribution. Polydispersed size distributions were transformed into monodispersed distributions, with relatively high mass yields reaching 65%. Based on spatial Langmuir probe measurements and detailed aerosol dynamics modelling, we propose that upon exposure to different plasma densities, particles can vaporize and then the resultant vapor can either nucleate into particles or recondense on the remaining clusters, eventually leading to the modification of the size distribution. When particles vaporize completely and the vapor is conserved, the result is the conversion of a polydispersed size distribution into a monodispersed size distribution. This unusual mechanism that involves vaporization at low temperature will be detailed with further experimental observations with different materials. Methods of tuning the final size will be elaborated.