AVS 64th International Symposium & Exhibition
    Spectroscopic Ellipsometry Focus Topic Monday Sessions
       Session EL+AS+EM-MoA

Paper EL+AS+EM-MoA2
Ellipsometry Based Observation of Material Ordering Process in Holography

Monday, October 30, 2017, 2:00 pm, Room 9

Session: Spectroscopic Ellipsometry: Novel Applications and Theoretical Approaches
Presenter: Hao Jiang, Huazhong University of Science and Technology, China
Authors: H. Jiang, Huazhong University of Science and Technology, China
H. Peng, Huazhong University of Science and Technology, China
Y. Liao, Huazhong University of Science and Technology, China
S. Liu, Huazhong University of Science and Technology, China
Correspondent: Click to Email
Ordered materials with superior performance have been constantly pursued. Nevertheless, the direct, precise and non-destructive observation of the ordering process, which is especially critical for continuous manufacturing, remains a formidable challenge. Herein, we introduce Mueller matrix ellipsometry (MME) as a nondestructive method to quantitatively observe the material ordering process during holography. This non-destructive observation directly offers the exact width, refractive index, nanoparticle weight fraction and volume fraction in each constructive (bright) or destructive (dark) interference area, which is impossible to be implemented using other existing techniques. Meanwhile, the width of dark region is observed to decrease while the width of bright region increases with an augmentation of the holographic recording time, distinct from previous assumption. More importantly, an apparent diffusion coefficient of 1.3×10-15 m2 s-1 is determined on the basis of recording time-dependent grating structure observation, which is 3 orders of magnitude lower than the Stokes-Einstein prediction. The distinct diffusion coefficient is regarded to be the result of competition between the forth diffusion driven by the chemical reaction and backward diffusion arising from nanoparticle concentration gradient. This novel protocol is envisioned to pave the way for precisely and non-destructively understanding the ordered structure formation in electrics, photonics, photovoltaics, biomaterials and other disciplines.