| AVS 64th International Symposium & Exhibition | |
| Spectroscopic Ellipsometry Focus Topic | Monday Sessions |
| Session EL+AS+EM+TF-MoM |
| Session: | Application of SE for the Characterization of Thin Films and Nanostructures |
| Presenter: | Neil Murphy, Air Force Research Laboratory |
| Authors: | N.R. Murphy, Air Force Research Laboratory L. Sun, General Dynamics Information Technology J.G. Jones, Air Force Research Laboratory J.T. Grant, Azimuth Corporation |
| Correspondent: | Click to Email |
Eureqa, developed by Nutonian Inc., is a proprietary modeling engine based on automated evolutionary algorithms. In this study, we utilized Eureqa to parameterize both the amplitude and phase difference data for reactively sputtered thin films. Specifically, evolutionary algorithms are used to develop and validate models for fitting raw ellipsometric data for a variety of optical materials including SiO2, Ta2O5, and Aluminum Zinc Oxide. These films, deposited using pulsed DC magnetron sputtering, were deposited on both silicon and fused quartz substrates, and measured using a J.A. Woollam VASE system. The resulting models are then compared to traditional models that are currently utilized to fit the candidate materials systems.