| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | PS+SS+TF-FrM1 Invited Paper Atomic Layer Etching of Silicon Dioxide to Enable Self-aligned Contact Integration B. Finch, H. Singh, Eric Hudson, Lam Research Corporation |
| 9:00am | PS+SS+TF-FrM3 High Performance Self Align Contact Etching with Newly developed Quasi-ALE Akihiro Tsuji, Tokyo Electron Miyagi Limited, Japan, M. Tabata, H. Watanabe, T. Katsunuma, Tokyo Electron Miyagi Limited, M. Honda, Tokyo Electron Miyagi Limited, Japan |
| 9:20am | PS+SS+TF-FrM4 Fluorocarbon Based Atomic Layer Etching of Si3N4 and Selectivity of SiO2 over Si3N4 Chen Li, D. Metzler, G.S. Oehrlein, University of Maryland, College Park, C.S. Lai, M. Danek, E.A. Hudson, A. Dulkin, Lam Research Corporation |
| 9:40am | PS+SS+TF-FrM5 Chamber Wall Effect for Fluorocarbon Assisted Atomic Layer Etching of SiO2 Using Cyclic Ar/C4F8 Plasma Masatoshi Kawakami, Hitachi High-Technologies, Japan, D. Metzler, C. Li, G.S. Oehrlein, University of Maryland, College Park |
| 10:00am | PS+SS+TF-FrM6 Invited Paper Potential Solutions for Atomic Precision Etching Olivier Joubert, LTM-CNRS, France, E. Despiau-Pujo, LTM, France, G. Cunge, LTM - CEA/LETI, France, L. Vallier, J. Dubois, A. Tavernier, Univ. Grenoble Alpes-CNRS-CEA/Minatec-LTM, France, O. Luere, S. Banna, Y. Zhang, Applied Materials |
| 10:40am | PS+SS+TF-FrM8 Molecular Dynamics Simulations of Atomic Layer Etching by Low Energy Ions Jun-Chieh Wang, S. Rauf, J.A. Kenney, L. Dorf, K.S. Collins, Applied Materials Inc. |
| 11:00am | PS+SS+TF-FrM9 Atomic Layer Etching of InGaAs using Cl2/Ar Ion Beam Jinwoo Park, D.H. Yun, H.S. Kim, G.Y. Yeom, Sungkyunkwan University, Republic of Korea |
| 11:20am | PS+SS+TF-FrM10 InGaN Quantum Nanodisks Fabrication by Bio-Template and Neutral Beam Etching Yi-Chun Lai, National Chiao Tung University, Taiwan, Republic of China, A. Higo, C. Thomas, C.Y. Lee, T. Tanikawa, K. Shojiki, S. Kuboya, R. Katayama, Tohoku University, Japan, T. Kiba, Hokkaido University, Japan, I. Yamashita, Nara Institute of Science and Technology, Japan, A. Murayama, Hokkaido University, Japan, P.Yu. Yu, National Chiao Tung University, Taiwan, Republic of China, S. Samukawa, Tohoku University |
| 11:40am | PS+SS+TF-FrM11 Towards a Nanoscale Plasma Etching Precision: Molecular Dynamics Simulations of Si-Cl Interactions Paulin Brichon, Univ. Grenoble Alpes-CNRS-CEA/Minatec-LTM,38000 Grenoble-France, E. Despiau-Pujo, LTM, France, O. Mourey, Univ. Grenoble Alpes-CNRS-CEA/Minatec-LTM,38000 Grenoble-France, G. Cunge, LTM - CEA/LETI, France, O. Joubert, Univ. Grenoble Alpes-CNRS-CEA, France |