| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | PS+AP+SE-ThA1 Invited Paper Evolutionary Trends in Ion Implantation Anthony Renau, Applied Materials, Varian Semiconductor Equipment |
| 3:00pm | PS+AP+SE-ThA3 Invited Paper Conformal Arsenic Doping using a Radial Line Slot Antenna Microwave Plasma Source Hirokazu Ueda, Tokyo Electron Limited, Japan, P. Ventzek, Tokyo Electron America, Inc., M. Oka, Y. Kobayashi, Y. Sugimoto, Tokyo Electron Ltd., T. Nozawa, Tokyo Electron Ltd., Japan, S. Kawakami, Tokyo Electron Ltd. |
| 4:00pm | PS+AP+SE-ThA6 Invited Paper Practical Application of Atom Probe to Analysis of Ion Implantation Ty Prosa, CAMECA Instruments Inc. |
| 4:40pm | PS+AP+SE-ThA8 Optical Emission Spectroscopy to Determine Plasma Parameters in an Oxygen Inductively Coupled Plasma Nathaniel Ly, J. Boffard, C.C. Lin, A.E. Wendt, University of Wisconsin - Madison, S. Radovanov, H. Persing, A. Likhanskii, Applied Materials, Inc. |
| 5:00pm | PS+AP+SE-ThA9 Adhesion Improvement of Carbon Nitride Coatings on Steel Surfaces by Metal Ion Implantation using HiPIMS Konstantinos Bakoglidis, G. Greczynski, S. Schmidt, L. Hultman, Linkoping University, Sweden |