| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS+2D-ThM1 Invited Paper Low Pressure Plasma Cleaning and Doping of CVD Graphene Daniil Marinov, LPP-CNRS, Ecole Polytechnique, France, G. Cunge, LTM - CEA/LETI, France, D. Ferrah, CEA, LETI, MINATEC Campus, France, E.V. Johnson, LPICM-CNRS, Ecole Polytechnique, France, J.-P. Booth, LPP-CNRS, Ecole Polytechnique, France |
| 8:40am | PS+2D-ThM3 Sensing Cleanliness of PMMA Transferred CVD Grown Graphene Christian Teichert, M.C. Kratzer, Montanuniversität Leoben, Austria, B.C. Bayer, University of Cambridge, UK |
| 9:00am | PS+2D-ThM4 Invited Paper Plasma Processes of Graphene and Related 2d Materials for Energy Applications L.C. Chen, Indrajit Shown, National Taiwan University, Taiwan, Republic of China |
| 11:00am | PS+2D-ThM10 Engineering Chemical Functionality in Graphene Sandra Hernandez, P.E. Sheehan, S. Tsoi, P. Dev, J.T. Robinson, C. Junkermeier, K.E. Whitener, W.K. Lee, T.L. Reinecke, S.G. Walton, Naval Research Laboratory |
| 11:20am | PS+2D-ThM11 Formation of Aromatic Nitrogen Groups in Graphene Films by Post-Growth Treatment in Late-Afterglows of Nitrogen Microwave Plasmas Luc Stafford, Universite de Montreal, Canada |