| AVS 62nd International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
| Session PS-ThP |
| Session: | Plasma Science and Technology Poster Session |
| Presenter: | Devin Coleman, University of California - Riverside |
| Authors: | D. Coleman, University of California - Riverside T. Lopez, University of California - Riverside O. Yasar-Inceolgu, University of California - Riverside L. Mangolini, University of California - Riverside |
| Correspondent: | Click to Email |
The synthesis of beta-phase silicon carbide nanoparticles exhibiting a hollow core-shell morphology is demonstrated by means of a two-step non-thermal plasma method.[1] Crystalline silicon nanoparticles are nucleated from silane precursor gas in a non-thermal plasma reactor similar to the one described in [2] and injected into a secondary methane-containing plasma reactor, where they are carbonized to form beta-phase silicon carbide nanoshells. An analytical solution of the 1D diffusion equation in spherical coordinates, as well as the lattice volume expansion from silicon to silicon carbide are used to explain the formation of the interior void. This provides an alternative to previously reported results, which invoke the nanoscale Kirkendall effect to explain the void formation by means of fast out-diffusion of the core element.[3] Further consideration of the system kinetics indicates interactions with the ionized gas leads to particle superheating, allowing for the diffusion of carbon into the silicon matrix and nucleation of beta-phase silicon carbide to occur during the short residence time of the particles in the system. This work expands upon the materials achievable by non-thermal plasma synthesis and reinforces its potential as an industrial materials processing method. Furthermore, it suggests that such systems offer the capability to engineer particle morphology.
References:
[1] Hollow silicon carbide nanoparticles from a non-thermal plasma process. D. Coleman, T. Lopez, O. Yasar-Inceoglu, and L. Mangolini. J. Appl. Phys. In press (2015).
[2] Silicon nanocrystal production through non-thermal plasma synthesis: a comparative study between silicon tetrachloride and silane precursors. O. Yasar-Inceoglu, T. Lopez, E. Farshihagro, and L. Mangolini, Nanotechnology 23, 255604 (2012).
[3] Formation of Hollow Nanocrystals Through the Nanoscale Kirkendall Effect. Y. Yin, R. M. Rioux, C. K. Erdonmez, S. Hughes, G. A. Somorjai, and A. P. Alivisatos, Science 304, 711 (2004).