| AVS 61st International Symposium & Exhibition | |
| Thin Film | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF+MS+PS-WeM1 Invited Paper ALD and Beyond CMOS Materials Robert Wallace, University of Texas at Dallas |
| 9:00am | TF+MS+PS-WeM4 Combining Gas Phase Aerosol Deposition with Atomic Layer Deposition for Fast Thin Film Deposition: A Case Study of Transparent Conducting ZnO Elijah Thimsen, Washington University, St. Louis, M. Johnson, A. Wagner, A. Mkhoyan, U.R. Kortshagen, E.S. Aydil, University of Minnesota |
| 9:20am | TF+MS+PS-WeM5 Detecting Order in the Molecular Layer Deposition of Polymer Films by X-Ray Diffraction David Bergsman, R.W. Johnson, R. Britto, S.F. Bent, Stanford University |
| 9:40am | TF+MS+PS-WeM6 Native Oxide Diffusion and Removal During the Atomic Layer Deposition of Ta2O5 on InAs(100) Surfaces Alex Henegar, T. Gougousi, University of Maryland, Baltimore County |
| 11:00am | TF+MS+PS-WeM10 Invited Paper ALD in High Aspect Ratio Structures and Nanoporous Materials C. Detavernier, Jolien Dendooven, University of Ghent, Belgium |
| 11:40am | TF+MS+PS-WeM12 Pyrolysis of Alucone MLD Films to Form Electrically Conducting and Nanodomained Al2O3/C Composite Films J.J. Travis, J.W. DuMont, Steven George, University of Colorado, Boulder |
| 12:00pm | TF+MS+PS-WeM13 Atomic Layer Deposition of Metal Oxides on Ultra-High Aspect Ratio, Vertically Aligned Carbon Nanotube Arrays Kelly Stano, M. Carroll, R.P. Padbury, J.S. Jur, P. Bradford, North Carolina State University |