AVS 61st International Symposium & Exhibition
    Thin Film Wednesday Sessions
       Session TF+MS+PS-WeM

Invited Paper TF+MS+PS-WeM1
ALD and Beyond CMOS Materials

Wednesday, November 12, 2014, 8:00 am, Room 307

Session: Applied ALD: Nanoelectronics and Emerging Applications
Presenter: Robert Wallace, University of Texas at Dallas
Correspondent: Click to Email

Two-dimensional layered materials, such as graphene and transition metal dichalcogenides (TMDs), have been recently proposed for a number of novel device concepts due to their interesting materials properties. For example, the possibility of low surface defect densities due to an anticipated dearth of surface defects and dangling bonds raises the prospect of improved performance for low power tunnel field effect logic devices that switch on and off very rapidly due to the anticipated steep subthreshold slope characteristic. However, for ALD processes, such surfaces present significant challenges for nucleation and growth. This talk will review our recent work on in-situ characterization of 2D materials for such device applications. This research is supported in part by the STARNet Center for Low Energy Systems Technology, sponsored by the Semiconductor Research Corporation (SRC) and DARPA, the SWAN Center sponsored by the SRC Nanoelectronics Research Initiative and NIST, and by an IBM Faculty Award.