AVS 61st International Symposium & Exhibition
    Nanometer-scale Science and Technology Tuesday Sessions

Session NS+HI-TuM
Nanopatterning and Nanolithography 

Tuesday, November 11, 2014, 8:00 am, Room 304
Moderators: Nancy Burnham, Worcester Polytechnic Institute, Leonidas Ocola, Argonne National Laboratory


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am NS+HI-TuM1 Invited Paper
Nanoetching and Characterization Towards sub-5 nm Patterning
Deirdre Olynick, D. Staaks, D. Tierno, S. Dallarto, S. Sassolini, B. Muddiman, Z. Lui, G. Calafiore, Lawrence Berkeley National Laboratory, X. Gu, T.P. Russell, University of Massachusetts, Amherst, M. Kocsis, Inpria Corporation
8:40am NS+HI-TuM3
Cut Patterning Challenges for the 14nm-Node and Beyond
Ryan Jung, J.R. Sporre, F.L. Lie, S. Kanakasabapathy, S. Sieg, IBM Albany Nanotech Center, A. Ranjan, S. Voronin, A. Raley, V. Rastogi, A. Ko, TEL Technology Center, America, LLC, D. Lee, Samsung Electronics
9:00am NS+HI-TuM4
Nanopore Memristors: Sub-10nm Devices Built on Membranes Milled with a Helium Ion Microscope
Douglas Ohlberg, J.P. Strachan, W. Thompson, Z.Y. Li, R.S. Williams, Hewlett Packard
9:20am NS+HI-TuM5
Characterization of Cluster-Based High-Resolution Inorganic Resists
Rose Ruther, R.P. Oleksak, R. Frederick, B.T. Flynn, G.S. Herman, Oregon State University
9:40am NS+HI-TuM6
Development Characteristics of PMMA in Alternative Alcohol:Water Mixtures
Leonidas Ocola, Argonne National Laboratory
11:00am NS+HI-TuM10
Room Temperature Electron Beam Assisted Oxygen Purification of Electron Beam Induced Pt Deposits: Towards Pure and High-Fidelity Nanostructures
Brett Lewis, M.G. Stanford, University of Tennessee, H. Plank, Graz University of Technology, Austria, J.H. Noh, University of Tennessee, J. Fowlkes, Oak Ridge National Laboratory, P.D. Rack, University of Tennessee
11:20am NS+HI-TuM11
Prospects for Nanofabrication using the Combination of STM-based Depassivation Lithography, Selective ALD, and Material Etch Processes
Joshua Ballard, Zyvex Labs, S. Anz, S. Sando, Systine, Inc., M. Bischof, University of North Texas, D. Dick, University of Texas at Dallas, J. Fu, National Institute of Standards and Technology (NIST), D. Jaeger, University of North Texas, R. Longo, University of Texas at Dallas, J. Owen, E. Fuchs, Zyvex Labs, S. McDonnell, University of Texas at Dallas, R. Reidy, University of North Texas, Y.J. Chabal, R.M. Wallace, University of Texas at Dallas, J. Randall, Zyvex Labs, A. Cherala, S. Singhal, S. Sreenivasan, University of Texas at Austin