| AVS 60th International Symposium and Exhibition | |
| Manufacturing Science and Technology | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | MS+AS+EL+EM+PS+TF-TuA1 Invited Paper Alphabet-Based Template Design Rules - A Key Enabler for a Manufacturable DSA Technology H. Yi, H-.S.P. Wong, Stanford University |
| 2:40pm | MS+AS+EL+EM+PS+TF-TuA3 Characterizing the Sensitivity of Block Copolymer Directed Self-Assembly Processes to Material and Process Variations C. Henderson, A. Peters, R. Lawson, P. Ludovice, Georgia Institute of Technology |
| 3:00pm | MS+AS+EL+EM+PS+TF-TuA4 DSA Patterning for sub-40 nm Pitch Features I.C. Estrada-Raygoza, C. Liu, Y. Yin, J. Abdallah, IBM Albany Nanotech Center, S. Mignot, GLOBALFOUNDRIES U.S. Inc., B.G. Morris, M.E. Colburn, IBM Albany Nanotech Center, V. Rastogi, N. Mohanti, A. Raley, A. Ko, TEL Technology Center, America, LLC |
| 4:40pm | MS+AS+EL+EM+PS+TF-TuA9 Advanced Gate Patterning Techniques for 14nm Node and Beyond F.L. Lie, R. Jung, Y. Yin, A. Banik, S. Kanakasabapathy, J.C. Arnold, S. Seo, B. Haran, IBM Corporation, Y. Moon, L. Jang, S. Bentley, GLOBALFOUNDRIES U.S. Inc., H. Kang, D. Bae, Samsung Electronics Co., A. Metz, C. Cole, K. Ito, S. Voronin, A. Ko, A. Ranjan, K. Kumar, TEL Technology Center, America, LLC |
| 5:00pm | MS+AS+EL+EM+PS+TF-TuA10 High Throughput Electrospinning of Ceramic Nanofibers S. Sood, P. Gouma, State University of New York at Stony Brook (Stony Brook University) |
| 5:20pm | MS+AS+EL+EM+PS+TF-TuA11 Manufacture and Characterization of Silver and Copper Nanorods Produced via Forcespun Nylon 6 Nanofibers Templates D.M. Mihut, K. Lozano, W. Zhao, The University of Texas Pan American |