| AVS 58th Annual International Symposium and Exhibition | |
| Nanomanufacturing Science and Technology Focus Topic | Tuesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | NM+MN+MS+TF-TuM1 Invited Paper A SANE Approach to Programmable Soft Lithography Teri Odom, Northwestern University |
| 8:40am | NM+MN+MS+TF-TuM3 Micromolding Surface-Initiated Polymerization: A Versatile Route for Microscale Replication onto a Solid Support C.A. Escobar, J.C. Tuberquia, N. Nizamidin, G. Kane Jennings, Vanderbilt University |
| 9:00am | NM+MN+MS+TF-TuM4 Si Mold Etching with Hard Mask for Bit-Patterned Media Masaru Kurihara, Hitachi, Ltd., Tokyo, M. Satake, Y. Tsuchiya, T. Nishida, Central Research Laboratory, Hitachi, Ltd., Japan, Y. Tada, H. Yoshida, Hitachi Research Laboratory, Hitachi, Ltd., Japan, N. Negishi, Central Research Laboratory, Hitachi, Ltd., Japan |
| 9:20am | NM+MN+MS+TF-TuM5 Invited Paper Directed Assembly of Block Copolymers to Advance the Performance of Conventional Lithography Paul Nealey, University of Wisconsin |
| 10:40am | NM+MN+MS+TF-TuM9 Measured Backscattered Electron Profile for Optimized Proximity Effect Correction David Czaplewski, L.E. Ocola, Argonne National Laboratory |
| 11:00am | NM+MN+MS+TF-TuM10 Invited Paper CMOS Density Scaling in Non-Planar Multi-Gate Devices: A Patterning Perspective Michael Guillorn, J. Chang, S. Bangsaruntip, C.-H. Lin, W.E. Haensch, IBM T.J. Watson Research Center |
| 11:40am | NM+MN+MS+TF-TuM12 High Resolution Dry Development D.L. Olynick, D.G. De Oteyza, P. Perera, P. Kulshreshtra, P. Ashby, M. Schmidt, S. Dhuey, B.D. Harteneck, R.M. Falch, A. Schwartzberg, P.J. Schuck, S. Cabrini, Lawrence Berkeley National Laboratory |