AVS 58th Annual International Symposium and Exhibition
    Applied Surface Science Division Wednesday Sessions
       Session AS-WeA

Paper AS-WeA9
Challenges in Surface and Interface Analysis of Thin Films

Wednesday, November 2, 2011, 4:40 pm, Room 102

Session: Correlative Analysis - A Multi-technique Approach for Identification and Structure-Property Relationships
Presenter: Hong Piao, General Electric Co.
Authors: H. Piao, General Electric Co.
Y.F. Hu, Canadian Light Source Inc., Canada
J. Fronheiser, General Electric Co.
V. Tilak, General Electric Co., India
M. Karadge, General Electric Co.
M. Morra, General Electric Co.
Correspondent: Click to Email
Surface analysis methods play an important role in the characterization of thin films. The analysis of “nano-structured” films requires further development of existing surface analysis methods and exploration of new techniques. The aim of this presentation is to identify some of the challenges that exist in understanding surface and interface states of thin films using conventional X-ray Photoelectron Spectroscopy (XPS). Unique advances in thin film analysis using synchrotron-based X-ray Photoemission (XPS) and X-ray Absorption Near Edge Structure (XANES in both TEY and FLY modes) techniques are discussed. The presentation gives an emphasis on how these methods complement each other. Examples describing the characterization of thin films are given in two areas of technology that are growing in importance: (1) Gate oxide development on SiC and (2) corrosion inhibitor coatings.