| AVS 56th International Symposium & Exhibition | |
| Thin Film | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF-FrM1 Thin-film Barrier on Foil for Roll-to-Roll OLEDs F.J.H. van Assche, E.W.A. Young, J.J. Michels, TNO Holst Centre, The Netherlands, G.H. Rietjens, P. van de Weijer, P.C.P. Bouten, Philips Research Laboratories, The Netherlands, A.M.B. van Mol, TNO Holst Centre, The Netherlands |
| 8:40am | TF-FrM2 Study on MoO3-x Films Deposited by Reactive Sputtering for Organic Light-Emitting Diodes N. Oka, H. Watanabe, Y. Sato, Aoyama Gakuin University, Japan, N. Ito, H. Tsuji, Panasonic Electric Works Co., Ltd., Japan, Y. Shigesato, Aoyama Gakuin University, Japan |
| 9:00am | TF-FrM3 Invited Paper Amorphous and Crystalline Metaloxide Semiconductors for Transistor Applications A. Facchetti, Northwestern University |
| 9:40am | TF-FrM5 Permittivity-Engineered TCOs Studied by In Situ Spectroscopic Ellipsometry J. Burst, National Renewable Energy Laboratory, T.J. Peshek, Arizona State University and National Renewable Energy Laboratory, X. Li, T.A. Gessert, D.H. Levi, National Renewable Energy Laboratory, B.R. Rogers, S. Weiss, Vanderbilt University |
| 10:20am | TF-FrM7 Reactive Magnetron Sputter Deposition of Al-doped ZnO Films with Unipolar Pulsing and Impedance Control System Y. Nishi, K. Hirohata, N. Tsukamoto, Y. Sato, N. Oka, Y. Shigesato, Aoyama Gakuin University, Japan |
| 10:40am | TF-FrM8 Study on Spatial Distribution of Electrical Properties for Al-doped ZnO Films Deposited by DC Magnetron Sputtering using Various Inert Gases Y. Sato, K. Ishihara, N. Oka, Y. Shigesato, Aoyama Gakuin University, Japan |
| 11:00am | TF-FrM9 Multilayer Active Coatings on Flexible Polymer Sheet using High Rate, Closed Field Reactive Sputtering J.M. Walls, Loughborough University, UK, D.R. Gibson, S. Stanley, A.R. Waugh, Applied Multilayers Ltd, UK |