| AVS 55th International Symposium & Exhibition | |
| Thin Film | Wednesday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | TF-WeM1 Invited Paper Growth and Functional Properties of Thin Film Oxides Synthesized under Photon Irradiation S. Ramanathan, Harvard University |
| 8:40am | TF-WeM3 A Zone Diagram for Conformal Film Growth by CVD J.R. Abelson, A. Yanguas-Gil, N. Kumar, Y. Yang, University of Illinois at Urbana-Champaign |
| 9:00am | TF-WeM4 Conformal Chemical Vapor Deposition of Metal Oxide Thin Films using Metal-Diboranamide Precursors A. Yanguas-Gil, N. Kumar, S.R. Daly, Y. Yang, G.S. Girolami, J.R. Abelson, University of Illinois at Urbana-Champaign |
| 9:20am | TF-WeM5 Chemical Vapor Deposition of WNxCy using Tungsten Piperidylhydrazido Complex: Deposition, Characterization and Diffusion Barrier Evaluation D.J. Kim, O.H. Kim, T.J. Anderson, J. Koller, L. McElwee-White, C.L. Leu, J.M. Tsai, D.P. Norton, University of Florida |
| 9:40am | TF-WeM6 Conformality of Chemical Vapor Deposited Copper Oxide Thin Films in High Aspect Ratio Features for ULSI/MEMS Applications Y. Shimogaki, Y. Susa, The University of Tokyo, Japan |
| 10:40am | TF-WeM9 Structure and Morphology of Pentacene Film Grown on HOPG J. Götzen, D. Käfer, Ch. Wöll, G. Witte, Ruhr-University, Germany |
| 11:00am | TF-WeM10 Electrically Controllable Stationary Hadamard Shutter Exploiting the Semiconductor-To-Metallic Phase Transition of W-doped VO2 Arrays M. Soltani, M. Chaker, INRS-Énergie, Matériaux et Télécommunications, Canada, E. Haddad, R.V. Kruzelecky, W. Jamroz, MPB Communications Inc., Canada, J. Margot, Université de Montréal, Canada, P. Laou, S. Paradis, Defence R&D Canada-Valcartier |
| 11:20am | TF-WeM11 Molecular Beams Tunable in Energy Yield Novel Growth Behavior in Small-Molecule Organic Semiconductors A. Amassian, S. Hong, T.V. Desai, Cornell University, S. Kowarik, University of California at Berkeley, J.E. Goose, A. Papadimitratos, V.A. Pozfin, Cornell University, A.R. Woll, D.M. Smilgies, Cornell High Energy Synchrotron Source, F. Schreiber, Universität Tübingen, Germany, P. Clancy, G.G. Malliaras, J.R. Engstrom, Cornell University |
| 11:40am | TF-WeM12 Vanadium Oxide Thin Films for IR Imaging Bolometric Applications Deposited by Reactive Pulsed DC Sputtering N.M. Fieldhouse, S.S.N. Bharadwaja, M.W. Horn, S.M. Pursel, R. Carey, Pennsylvania State University |