Invited Paper TF-WeM1
Growth and Functional Properties of Thin Film Oxides Synthesized under Photon Irradiation

Wednesday, October 22, 2008, 8:00 am, Room 302

Thin film oxides play a key role in several advanced electronics and energy technologies such as alternate gate dielectrics, memory devices and functional membranes in energy generation. Developing novel routes for synthesis of oxide thin films with controlled structure and stoichiometry is therefore of great importance. In this talk, we will present experimental and modeling results from our on-going work on synthesis of ultra-thin oxides under photon irradiation with particular emphasis on structure-property relations. Model systems that will be discussed include ultra-thin fluorite-strucutred zirconia dielectrics synthesized by low temperature ultra-violet ozone oxidation and yttria-doped zirconia films grown by physical vapor deposition methods. The role of photon irradiation during oxide formation will be discussed in depth along with their impact on functional properties. Examples of applications of the processing technique in advanced electronic devices as well as solid oxide fuel cells will be presented.