AVS 55th International Symposium & Exhibition
    Advanced Surface Engineering Thursday Sessions

Session SE+TF+NC-ThM
Glancing Angle Deposition (GLAD) I

Thursday, October 23, 2008, 8:00 am, Room 204
Moderator: T. Karabacak, University of Arkansas at Little Rock


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am SE+TF+NC-ThM1 Invited Paper
Sculptured Thin Films: Something Old, Something New, Something Borrowed, Something Blue
A. Lakhtakia, Pennsylvania State University
8:40am SE+TF+NC-ThM3
Randomness and Roughening in Glancing Angle Deposition
K. Robbie, T. Brown, Queen's University, Canada, S. Asgharizadeh, M. Sutton, McGill University, Canada
9:00am SE+TF+NC-ThM4
Scaling of Nanorods during Glancing Angle Deposition: Effect of Surface Diffusion
S. Mukherjee, D. Gall, Rensselaer Polytechnic Institute
9:20am SE+TF+NC-ThM5
Glancing Angle Deposition on Rotating Patterned Substrates: Experiment and Simulation
C. Patzig, Leibniz-Institute of Surface Modification Leipzig, Germany, T. Karabacak, University of Arkansas at Little Rock, B. Fuhrmann, Martin-Luther-University Halle, Germany, B. Rauschenbach, Leibniz-Institute of Surface Modification Leipzig, Germany
9:40am SE+TF+NC-ThM6
Fabrication of Inclined Nano-Rough Columns by Combined Glancing Angle Deposition (GLAD) and Colloidal Lithography for Biological Applications
A. Dolatshahi-Pirouz, M. Foss, D. Sutherland, J. Chevallier, F. Besenbacher, University of Aarhus, Denmark
10:40am SE+TF+NC-ThM9
Growth of Al Nanowhiskers on the Patterned Substrate by Glancing Angle Deposition at High Temperature
M. Suzuki, R. Kita, K. Hamachi, K. Nakajima, K. Kimura, Kyoto University, Japan
11:00am SE+TF+NC-ThM10
Characteristic Length Scale of Nanorods
H. Huang, RPI
11:20am SE+TF+NC-ThM11
Crystalline Organic Nanocolumn Arrays
J. Zhang, I. Salzmann, P. Schaefer, J.P. Rabe, N. Koch, Humboldt University Berlin, Germany
11:40am SE+TF+NC-ThM12
Competitive Growth Mechanisms of Aluminum Nitride Thin Films Deposited by Off-Normal Reactive Magnetron Sputtering
D. Deniz, University of New Hampshire, T. Karabacak, University of Arkansas at Little Rock, J.M.E. Harper, University of New Hampshire