| AVS 55th International Symposium & Exhibition | |
| Advanced Surface Engineering | Friday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | SE+PS-FrM1 Invited Paper On the Plasma Parameters in the High Power Impulse Magnetron Sputtering Discharge (HiPIMS) J.T. Gudmundsson, University of Iceland |
| 9:00am | SE+PS-FrM3 Deposition of Metal Oxide Coatings using Reactive High Power Impulse Magnetron Sputtering E. Wallin, M. Aiempanakit, Linköping University, Sweden, T.I. Selinder, E. Coronel, Sandvik Tooling, Sweden, U. Helmersson, Linköping University, Sweden |
| 9:20am | SE+PS-FrM4 A Mass/Energy Analysis of the Plasma during Modulated Pulse Power Sputtering W.D. Sproul, Reactive Sputtering, Inc., J. Lin, J.J. Moore, M. Hasheminiasari, Colorado School of Mines, R. Chistyakov, B. Abraham, Zond, Inc./Zpulser, LLC |
| 9:40am | SE+PS-FrM5 Process, Structure and Properties of Chromium and Chromium Nitride Coatings Synthesized using Modulated Pulse Power (MPP) Sputtering J. Lin, Z. Wu, Colorado School of Mines, W.D. Sproul, Reactive Sputtering, Inc., B. Mishra, J.J. Moore, M. Hasheminiasari, Colorado School of Mines, R. Chistyakov, B. Abraham, Zond, Inc./Zpulser, LLC |
| 10:00am | SE+PS-FrM6 Invited Paper Deposition Rate of High-Power-Pulse Magnetron Sputtering Processes J. Emmerlich, S. Mráz, S. Konstantinidis, RWTH Aachen University, Germany, R. Snyders, University of Mons, Belgium, J.M. Schneider, RWTH Aachen University, Germany |
| 10:40am | SE+PS-FrM8 Effects on Thin Film Growth Due to Anomalous Transport in High Power Impulse Magnetron Sputtering D. Lundin, P. Larsson, E. Wallin, Linköping University, Sweden, M. Lattemann, TU Darmstadt and Forschungszentrum Karlsruhe GmbH, Germany, N. Brenning, Royal Institute of Technology, Sweden, U. Helmersson, Linköping University, Sweden |
| 11:00am | SE+PS-FrM9 High Power Impulse Magnetron Sputtering of Ti-Si-C Multifunctional Thin Films M. Samuelsson, Linköping University, Sweden, H. Högberg, H. Ljungcrantz, Impact Coatings, Sweden, U. Helmersson, Linköping University, Sweden |
| 11:20am | SE+PS-FrM10 Modulated Pulse Power Deposition of Aluminum Oxide Nanometer Scale Multilayer Films R. Chistyakov, Zond Inc., B. Abraham, Zpulser LLC, W.D. Sproul, Reactive Sputtering, Inc., J.J. Moore, J. Lin, Colorado School of Mines |
| 11:40am | SE+PS-FrM11 The Specification and Optimization of HIPIMS Power Supply Parameters D. Ochs, Huettinger Electronics GmbH, Germany, P. Ozimek, Huettinger Electronics Sp. z.o.o., Poland, A.G. Spencer, Alacritas Consultancy Ltd., UK |