AVS 55th International Symposium & Exhibition
    Advanced Surface Engineering Friday Sessions

Session SE+PS-FrM
Pulsed Plasmas in Surface Engineering

Friday, October 24, 2008, 8:20 am, Room 204
Moderator: A. Erdemir, Argonne National Laboratory


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:20am SE+PS-FrM1 Invited Paper
On the Plasma Parameters in the High Power Impulse Magnetron Sputtering Discharge (HiPIMS)
J.T. Gudmundsson, University of Iceland
9:00am SE+PS-FrM3
Deposition of Metal Oxide Coatings using Reactive High Power Impulse Magnetron Sputtering
E. Wallin, M. Aiempanakit, Linköping University, Sweden, T.I. Selinder, E. Coronel, Sandvik Tooling, Sweden, U. Helmersson, Linköping University, Sweden
9:20am SE+PS-FrM4
A Mass/Energy Analysis of the Plasma during Modulated Pulse Power Sputtering
W.D. Sproul, Reactive Sputtering, Inc., J. Lin, J.J. Moore, M. Hasheminiasari, Colorado School of Mines, R. Chistyakov, B. Abraham, Zond, Inc./Zpulser, LLC
9:40am SE+PS-FrM5
Process, Structure and Properties of Chromium and Chromium Nitride Coatings Synthesized using Modulated Pulse Power (MPP) Sputtering
J. Lin, Z. Wu, Colorado School of Mines, W.D. Sproul, Reactive Sputtering, Inc., B. Mishra, J.J. Moore, M. Hasheminiasari, Colorado School of Mines, R. Chistyakov, B. Abraham, Zond, Inc./Zpulser, LLC
10:00am SE+PS-FrM6 Invited Paper
Deposition Rate of High-Power-Pulse Magnetron Sputtering Processes
J. Emmerlich, S. Mráz, S. Konstantinidis, RWTH Aachen University, Germany, R. Snyders, University of Mons, Belgium, J.M. Schneider, RWTH Aachen University, Germany
10:40am SE+PS-FrM8
Effects on Thin Film Growth Due to Anomalous Transport in High Power Impulse Magnetron Sputtering
D. Lundin, P. Larsson, E. Wallin, Linköping University, Sweden, M. Lattemann, TU Darmstadt and Forschungszentrum Karlsruhe GmbH, Germany, N. Brenning, Royal Institute of Technology, Sweden, U. Helmersson, Linköping University, Sweden
11:00am SE+PS-FrM9
High Power Impulse Magnetron Sputtering of Ti-Si-C Multifunctional Thin Films
M. Samuelsson, Linköping University, Sweden, H. Högberg, H. Ljungcrantz, Impact Coatings, Sweden, U. Helmersson, Linköping University, Sweden
11:20am SE+PS-FrM10
Modulated Pulse Power Deposition of Aluminum Oxide Nanometer Scale Multilayer Films
R. Chistyakov, Zond Inc., B. Abraham, Zpulser LLC, W.D. Sproul, Reactive Sputtering, Inc., J.J. Moore, J. Lin, Colorado School of Mines
11:40am SE+PS-FrM11
The Specification and Optimization of HIPIMS Power Supply Parameters
D. Ochs, Huettinger Electronics GmbH, Germany, P. Ozimek, Huettinger Electronics Sp. z.o.o., Poland, A.G. Spencer, Alacritas Consultancy Ltd., UK