| AVS 55th International Symposium & Exhibition | |
| Advanced Surface Engineering | Friday Sessions |
| Session SE+PS-FrM |
| Session: | Pulsed Plasmas in Surface Engineering |
| Presenter: | A.G. Spencer, Alacritas Consultancy Ltd., UK |
| Authors: | D. Ochs, Huettinger Electronics GmbH, Germany P. Ozimek, Huettinger Electronics Sp. z.o.o., Poland A.G. Spencer, Alacritas Consultancy Ltd., UK |
| Correspondent: | Click to Email |
HIPIMS is a rapidly emerging technique for surface modification. It is well know the improvements in surface properties that can be acheived (in particular in mechanical properties). What is less well known is how to specify and operate the HIPIMS power supply. There are many aspects of the HIPIMS power supply that need to be specified at time of purchase, and adjusted for process optimization (average power, pulse power, pulse frequency, pulse length). Usually HIPIMS users are upgrading from a sputtering or evaporation process. These new HIPIMS parameters are therefore unfamiliar. This paper details the effects of each of these parameters, gives examples, and guidance on specifying a HIPIMS power supply.