| 8:00am |
PS1-WeM1
Studying the Interaction of Atomic Hydrogen with a-Si:H Thin Films using Evanescent-Wave Cavity Ring-Down Spectroscopy
F.J.J. Peeters, J. Zheng, I.M.P. Aarts, A.C.R. Pipino, W.M.M. Kessels, M.C.M. van de Sanden, Eindhoven University of Technology, The Netherlands |
| 8:20am |
PS1-WeM2
Unraveling the Importance of the Bimodal Energy Distribution of Bombarding Ions in Fluorocarbon Plasma Etching
F.L. Buzzi, Y.H. Ting, A.E. Wendt, University of Wisconsin-Madison |
| 8:40am |
PS1-WeM3
Diamonds and New Carbon Allotropes from Carbon Nanotubes at Room Temperature
M.J. Behr, University of Minnesota, A.R. Muniz, T. Singh, D. Maroudas, University of Massachusetts, Amherst, E.S. Aydil, University of Minnesota |
| 9:00am |
PS1-WeM4
Clarification of Surface and Interface Structures Exposed to Inductively Coupled Plasma with Various Superposed Bias Frequencies and Its Implication in Plasma Damage Control
Y. Nakakubo, A. Matsuda, Y. Ueda, H. Ohta, K. Eriguchi, K. Ono, Kyoto University, Japan |
| 9:20am |
PS1-WeM5
Studying Surface Damage during Dry Etching of Si(100) with Optical Second-Harmonic Generation in an Ar+/XeF2 Beam Setup
P.M. Gevers, J.J.H. Gielis, H.C.W. Beijerinck, M.C.M. van de Sanden, W.M.M. Kessels, Eindhoven University of Technology, the Netherlands |
| 9:40am |
PS1-WeM6
Ion Induced Etching Reaction of SiO2 and Si by CF3+ Irradiation
K. Karahashi, S. Hamaguchi, Osaka University, Japan |
| 10:40am |
PS1-WeM9
Enhanced Ground and Metastable Atom Densities in Ar Diluted N2 ICP for Nitridation of Hf Silicate
T. Kitajima, T. Nakano, National Defense Academy of Japan, T. Makabe, Keio University, Japan |
| 11:00am |
PS1-WeM10
Dependence of Carbon Removal Rate on the Structure of Porous Low-k SiOCH Films during N2/H2 Plasma Processes
K. Kurihara, Toshiba Corp., Japan |
| 11:20am |
PS1-WeM11
Mechanistic Influence of Substrate Temperature on the Plasma Deposition of Carbon Nitride Materials
J.M. Stillahn, E.R. Fisher, Colorado State University |
| 11:40am |
PS1-WeM12
Examining Plasma-Surface Interactions During Plasma Catalytic Removal of Atmospheric Pollutants
M.M. Morgan, E.R. Fisher, Colorado State University |