| AVS 55th International Symposium & Exhibition | |
| Plasma Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | PS1-ThA1 Spatial Density Distribution of Low-energy Electrons in a 2f-CCP by Laser Absorption and Optical Emission Spectroscopy T. Ohba, KEIO University, Japan, T. Kitajima, National Defense Academy of Japan, T. Makabe, KEIO University, Japan |
| 2:20pm | PS1-ThA2 Time-Resolved Absorption Spectroscopy with LEDs as Light Source: Application to Etching Plasma Monitoring G. Cunge, D. Vempaire, M. Touzeau, N. Sadeghi, LTM-CNRS, France |
| 2:40pm | PS1-ThA3 Invited Paper Spatio-temporally Resolved Optical Emission Spectroscopy for Investigating rf Plasmas and Micro-Discharges D. O'Connell, Queen’s University Belfast, Northern Ireland |
| 3:20pm | PS1-ThA5 Time Resolved Studies of Ion Dynamics in an RF-Biased Plasma Reactor B. Jacobs, W. Gekelman, University of California - Los Angeles, M. Barnes, Intevac Corporation, P. Pribyl, University of California - Los Angeles |
| 4:00pm | PS1-ThA7 A New Diagnostic Based on Fast Atom-Atom Ionization to Measure the Energy Distribution of a Fast Neutral Beam A. Ranjan, V.M. Donnelly, D.J. Economou, University of Houston |
| 4:20pm | PS1-ThA8 Metastable Probe in Remote Helium Plasma N. Miura, J. Hopwood, Tufts University |
| 4:40pm | PS1-ThA9 Etch Process Control with a Deposition-Tolerant Planar Electrostatic Probe J.P. Booth, D. Keil, C. Thorgrimsson, M. Nagai, J. Kim, L. Albarade, Lam Research Corporation |
| 5:00pm | PS1-ThA10 A New Diagnostic Tool of Radio-Frequency Etching Plasma Produced in Insulated Vessels H. Shindo, K. Kusaba, Tokai University, Japan |
| 5:20pm | PS1-ThA11 Near-Real-Time Two-Dimensional Wafer Surface Measurements for Process Optimization and Control C.T. Gabriel, Spansion, Inc., G. Roche, KLA-Tencor |