| AVS 55th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | NS+NC-ThM1 Confinement of Electrochemical Metal Deposition on the Nanometer Scale by a Hydrogen-Bonded Network/SAM Hybrid Structure C. Silien, M.T. Räisänen, University of St. Andrews, UK, R. Madueño, Universidad de Córdoba, Spain, M. Buck, University of St. Andrews, UK |
| 8:20am | NS+NC-ThM2 FIB Induced Self-Assembly of InAs Quantum Dots M.J. Noordhoek, J.Y. Lee, H. Mckay, A. Dehne, P. Rudzinski, J.M. Millunchick, University of Michigan - Ann Arbor |
| 8:40am | NS+NC-ThM3 Fabrication and Characterization of Conjugated Organosilicon Nanostructures with UHV STM and X-Ray Spectroscopy M.A. Walsh, J.-C. Lin, J.-H. Kim, Northwestern University, K.H. Bevan, Purdue University, G.Y. Stokes, F. Geiger, S.T. Nguyen, M.J. Bedzyk, M.C. Hersam, Northwestern University |
| 9:00am | NS+NC-ThM4 The Driving Forces Underlying the Formation of Chiral Domains of Fluorinated Diacids on HOPG S.N. Patole, C.J. Baddeley, M. Schuler, D. O'Hagan, N.V. Richardson, University of St Andrews, UK |
| 9:20am | NS+NC-ThM5 Potential-Controlled Force Curve Measurements between Electroactive Self-Assembled Monolayers Y. Yokota, T. Yamada, RIKEN (The Institute of Physical and Chemical Research), Japan, M. Kawai, RIKEN and The University of Tokyo, Japan |
| 9:40am | NS+NC-ThM6 Self-Assembly of Nanostructures and Nanocomposites using De Novo Designed Helix- Loop- Helix Polypeptides D. Aili, K. Enander, Linköping University, Sweden, L. Baltzer, Uppsala University, Sweden, B. Liedberg, Linköping University, Sweden |
| 10:40am | NS+NC-ThM9 Non-IPR C60 Solids D. Löffler, Universität Karlsruhe, Germany, N. Bajales, Universidad Nacional del Litoral-CONICET, Argentina, M. Cudaj, P. Weis, A. Böttcher, M.M. Kappes, Universität Karlsruhe, Germany |
| 11:00am | NS+NC-ThM10 Plasma Functionalized Surfaces for Chemically Directed Assembling of Luminescent Nanocrystals for Sensing and Optoelectronic Application E. Sardella, CNR-IMIP, Italy, F.D. Liuzzi, University of Bari, Italy, R. Comparelli, N. Depalo, CNR-IPCF, Italy, A. Agostiano, University of Bari, Italy, M.L. Curri, M. Striccoli, CNR-IPCF, Italy, P. Favia, R. d'Agostino, University of Bari, Italy |
| 11:20am | NS+NC-ThM11 Invited Paper Insertion of Block Copolymers Into the Lithographic Process P.F. Nealey, J.J. de Pablo, University of Wisconsin-Madison |