| AVS 55th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology | Thursday Sessions |
| Session NS+NC-ThM |
| Session: | Nanoscale Assembly |
| Presenter: | M.J. Noordhoek, University of Michigan - Ann Arbor |
| Authors: | M.J. Noordhoek, University of Michigan - Ann Arbor J.Y. Lee, University of Michigan - Ann Arbor H. Mckay, University of Michigan - Ann Arbor A. Dehne, University of Michigan - Ann Arbor P. Rudzinski, University of Michigan - Ann Arbor J.M. Millunchick, University of Michigan - Ann Arbor |
| Correspondent: | Click to Email |
The use of various patterning techniques for self-assembly of highly regular and dense quantum dot arrays are being pursued for applications in opto-electronics and quantum computing. In this work, we use a novel in-vacuo focused ion beam and growth system to pattern an array of holes on GaAs for subsequent deposition of InAs quantum dots. Exposure of GaAs(001) substrates to a 30keV 10pA beam of Ga+ ions as a function of pitch 140