AVS 55th International Symposium & Exhibition
    Graphene Topical Conference Tuesday Sessions

Session GR+EM+NC-TuM
Graphene and Carbon Electronics

Tuesday, October 21, 2008, 8:00 am, Room 306
Moderator: B.D. Schultz, International Technology Center


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am GR+EM+NC-TuM1
Two Dimensional Plasmon Behavior in Graphene Sheets on SiC(0001)
Y. Liu, The Pennsylvania State University, K.V. Emtsev, Th. Seyller, University Erlangen-Nurnberg, Germany, R.F. Willis, The Pennsylvania State University
8:20am GR+EM+NC-TuM2
Furnace Growth of High Quality Epitaxial Graphene on 4H-SiC(000-1)
M. Sprinkle, F. Ming, Georgia Institute of Technology, D. Martinotti, CEA Saclay, France, P.G. Soukiassian, Université de Paris-Sud/Orsay and CEA Saclay, France, C. Berger, E.H. Conrad, W.A. de Heer, Georgia Institute of Technology
8:40am GR+EM+NC-TuM3 Invited Paper
Toward Carbon Based Electronics
K. Bolotin, Columbia University
9:20am GR+EM+NC-TuM5
Spectro-Microscopy of Single and Multi-Layer Graphene Supported by a Weakly Interacting Substrate
K.R. Knox, S. Wang, Columbia University, A. Morgante, D. Cvetko, Laboratorio TASC-INFM, Italy, A. Locatelli, T.O. Mentes, M.A. Niño, Elettra - Sincrotrone Trieste S.C.p.A., Italy, P. Kim, R.M. Osgood, Columbia University
9:40am GR+EM+NC-TuM6
Intercalation and Ultrasonic Treatment of Graphite – a New Synthetic Route to Graphene
E. Widenkvist, Uppsala University, Sweden, R.A. Quinlan, The College of William and Mary, S. Akhtar, S. Rubino, Uppsala University, Sweden, D.W. Boukhvalov, M.I. Katsnelson, Radboud University of Nijmegen, the Netherlands, B. Sanyal, O. Eriksson, K. Leifer, H. Grennberg, U. Jansson, Uppsala University, Sweden
10:40am GR+EM+NC-TuM9 Invited Paper
Graphene: Exploring Carbon Flatland
E.W. Hill, A.K. Geim, University of Manchester, UK
11:20am GR+EM+NC-TuM11
The Mechanism of Graphene Growth on Metal Surfaces
E. Loginova, N.C. Bartelt, K.F. McCarty, P.J. Feibelman, Sandia National Laboratories
11:40am GR+EM+NC-TuM12
Conformal Dielectric Layers Deposited by ALD (Atomic Layer Deposition) for Graphene-based Nanoelectronics
B. Lee, S.Y. Park, H.Y. Kim, K.J. Cho, E.M. Vogel, M.J. Kim, R.M. Wallace, J. Kim, The University of Texas at Dallas