| AVS 55th International Symposium & Exhibition | |
| Applied Surface Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:00pm | AS-MoA1 Invited Paper Probing the Interfacial Chemistry of Polymer-Metal Systems with Electron Spectroscopy J.F. Watts, University of Surrey, UK |
| 2:40pm | AS-MoA3 2-Dimensional X-Ray Photoelectron Spectroscopy for Composite Surface Analysis S. Suzer, Bilkent University, Turkey |
| 3:00pm | AS-MoA4 Evaluation of Uncertainties in X-ray Photoelectron Spectroscopy Intensities Associated with Different Methods and Procedures for Background Subtraction C.J. Powell, J.M. Conny, National Institute of Standards and Technology |
| 3:20pm | AS-MoA5 Investigation of Shallow Buried Interfaces by Photoelectron Spectroscopy and its Application to Protective Films on Metals Y. Wang, P.M.A. Sherwood, Oklahoma State University |
| 4:00pm | AS-MoA7 Invited Paper Looking Beneath the Surface: Electron Spectroscopy with X-ray Standing Waves and Hard X-rays C.S. Fadley, University of California, Davis and Lawrence Berkeley National Laboratory |
| 4:40pm | AS-MoA9 Methods for X-ray Photoelectron Spectromicroscopy C.J. Blomfield, A.J. Roberts, S.J. Hutton, Kratos Analytical Ltd, UK, N. Fairley, Casa XPS Ltd, UK |
| 5:00pm | AS-MoA10 Structural Properties of Epitaxial SrHfO3 Thin Films on Si(100) M. Sawkar-Mathur, University of California, Los Angeles, C. Marchiori, J. Fompeyrine, IBM Zurich Research Laboratory, J. Bargar, M. Toney, Stanford Synchrotron Radiation Laboratory, J.P. Chang, University of California, Los Angeles |
| 5:20pm | AS-MoA11 Improved Depth Resolution for Scanning Auger Analysis Using a Novel Sample Preparation W. Liu, S. Schauer, D. Theodore, H. Ramirez, Freescale Semiconductor Inc. |