AVS 55th International Symposium & Exhibition
    Plasma Science and Technology Wednesday Sessions
       Session PS1-WeA

Paper PS1-WeA1
Adsorption and Desorption Dynamics of Atomic and Molecular Chlorine on Plasma-Conditioned Stainless Steel Surfaces

Wednesday, October 22, 2008, 1:40 pm, Room 304

Session: Fundamentals of Plasma-Surface Interactions II
Presenter: L. Stafford, Université de Montréal, Canada
Authors: L. Stafford, Université de Montréal, Canada
R. Khare, University of Houston
J. Guha, University of Houston
V.M. Donnelly, University of Houston
J.S. Poirier, Université de Montréal, Canada
J. Margot, Université de Montréal, Canada
Correspondent: Click to Email

We investigated the interactions of atomic and molecular chlorine with plasma-conditioned stainless steel surfaces through both experiments and modeling. The adsorption and desorption dynamics of Cl and Cl2 was characterized using a rotating substrate technique in which portion of the substrate surface is periodically exposed to an inductively coupled chlorine plasma and to an Auger electron spectrometer in separate, differentially-pumped chambers. After several hours of exposure to the Cl2 plasma, the stainless steel substrate became coated with a Si-oxychloride-based layer (Fe:Si:O:Cl = 1:7:15:6) due to chlorine adsorption and the slow erosion of the silica discharge tube. Analysis of products desorbing from this surface through measurements of pressure rises in the Auger chamber as a function of substrate rotation frequency showed significant adsorption and desorption of Cl2 with the plasma off, with sticking coefficients comparable to those obtained previously on plasma-conditioned anodized aluminum. Desorption rates were however much higher on stainless steel, probably because of its smoother surface morphology. When the plasma was turn on, a much larger pressure rise was observed due to delayed (i.e., Langmuir-Hinshelwood) recombination of Cl atoms. Recombination coefficients, γCl, ranged from 0.004 to 0.03 and increased with Cl-to-Cl2 number density ratio before reaching some plateau for Cl/Cl2 > 0.6. A similar behavior was previously observed on plasma-conditioned anodized aluminum. This set of gamma values was then applied to the modeling of high-density chlorine plasmas with large stainless steel or anodized aluminum surfaces exposed to the plasma. The model is based on fluid equations in which the particle balance equations for electrons, Cl, Cl2, Cl+, Cl2+, and Cl- are solved together with the corresponding flux equations and the energy balance equations. Using the gamma values determined in this study as a function of Cl/Cl2 number density ratio, model predictions of Cl and Cl2 densities in surface-wave and inductively coupled plasma reactors with both stainless steel and anodized aluminum walls will be compared with measured Cl and Cl2 densities.