AVS 55th International Symposium & Exhibition
    Plasma Science and Technology Monday Sessions
       Session PS-MoA

Paper PS-MoA1
Plasma Etching - The Early Days

Monday, October 20, 2008, 2:00 pm, Room 304

Session: Invited Highlights on Plasma-Surface Interactions - Honoring the Distinguished Career of Herbert H. Sawin
Presenter: J.W. Coburn, University of California at Berkeley
Correspondent: Click to Email

Remarkable progress has been made in the implementation and understanding of the pattern transfer capabilities of plasma etching in the 30 or so years this technique has been used in microelectronics manufacturing. Where did it all begin? One perspective of some of the early highlights introduced in the mid-1970s will be presented. The importance of studies supporting physical sputtering (both sputter-etching and sputter-deposition) using Ar glow discharges will be emphasized. A select few pioneering advances in processing chemistries will also be described.