AVS 54th International Symposium
    Thin Film Friday Sessions

Session TF1-FrM
Thin Films for Displays and Flexible Electronics

Friday, October 19, 2007, 8:00 am, Room 602/603
Moderator: M.A. Creatore, Eindhoven University of Technology, The Netherlands


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am TF1-FrM1
Effects of Processing Parameters on Electroluminescence of RF Magnetron Sputter Deposited ZnS: ErF3
D.M. DeVito, A.A Argun, E.S. Law, University of Florida, M. Puga-Lambers, M.R. Davidson, Microfabritech, P.H. Holloway, University of Florida
8:20am TF1-FrM2
Local Compositional Environment of Er in ZnS:ErF3 Thin Film Electroluminescent Phosphors
M.R. Davidson, University of Florida, S. Stoupin, Illinois Institute of Technology, D.M. DeVito, Oak Ridge National Laboratory, C. Segre, Illinois Institute of Technology, P.H. Holloway, University of Florida
8:40am TF1-FrM3 Invited Paper
Fabrication and Characterization of Indium Zinc Oxide-Based Thin Film Transistors
D.C. Paine, Brown University
9:20am TF1-FrM5
Near IR Electroluminescent Studies Of ZnS Photonic Crystal
E.S. Law, P.H. Holloway, University of Florida, N. Shepherd, North Texas State University
9:40am TF1-FrM6
Conformal CVD of MgO from Mg(H3BNMe2BH3)2 and Water: A New Process for Dielectric Barrier Layers in Plasma Display Panels
Y. Yang, D.Y. Kim, G.S. Girolami, J.R. Abelson, University of Illinois at Urbana-Champaign
10:00am TF1-FrM7
Other Impurity-co-doping Effect on the Stability of Resistivity in AZO and GZO Transparent Conducting Thin Films
T. Kuboi, Y. Honma, T. Miyata, T. Minami, Kanazawa Institute of Technology, Japan
10:20am TF1-FrM8
Sputtered In2O3 and ITO Thin Films Containing Zirconium
T.A. Gessert, National Renewable Energy Laboratory, Y. Yoshida, Colorado School of Mines, T.J. Coutts, National Renewable Energy Laboratory
10:40am TF1-FrM9
Electronic and Optical Properties of TiO2-based Transparent Conducting Oxide
T. Hitosugi, University of Tokyo, Japan, N. Yamada, Y. Furubayashi, S. Nakao, Y. Hirose, A. Ueda, Kanagawa Academy of Science and Technology (KAST), Japan, T. Shimada, T. Hasegawa, University of Tokyo, Japan
11:00am TF1-FrM10
Reactive Sputtered SnO2 as the Active Layer in Transparent Thin Film Transistors
W.-Y. Chen, J.-S. Chen, National Cheng Kung University, Taiwan
11:20am TF1-FrM11
Electron Field Emission Study of Reactive Sputter Deposited Palladium Oxide Thin Films
C.-J. Huang, F.-M. Pan, T.-C. Tzeng, C.-H. Tsai, National Chiao-Tung University, Taiwan