| AVS 54th International Symposium | |
| Thin Film | Friday Sessions |
| Session TF1-FrM |
| Session: | Thin Films for Displays and Flexible Electronics |
| Presenter: | T. Hitosugi, University of Tokyo, Japan |
| Authors: | T. Hitosugi, University of Tokyo, Japan N. Yamada, Kanagawa Academy of Science and Technology (KAST), Japan Y. Furubayashi, Kanagawa Academy of Science and Technology (KAST), Japan S. Nakao, Kanagawa Academy of Science and Technology (KAST), Japan Y. Hirose, Kanagawa Academy of Science and Technology (KAST), Japan A. Ueda, Kanagawa Academy of Science and Technology (KAST), Japan T. Shimada, University of Tokyo, Japan T. Hasegawa, University of Tokyo, Japan |
| Correspondent: | Click to Email |
Anatase Nb-doped TiO2 appears to be promising transparent conducting oxide (TCO) for use as a next generation transparent electrode.1,2 We report on electric properties of transparent conducting anatase Ti0.94Nb0.06O2 polycrystalline films on glass. The films deposited using pulsed laser deposition at substrate temperature of room temperature, with subsequent H2-annealing at 500°C, showed resistivity of 4.5 x 10-4 Ωcm at room temperature, and optical transmittance of 60-80 % in the visible light region. These results indicate that anatase Ti0.94Nb0.06O2 films have excellent potential for practical transparent conducting oxides.
1Furubayashi et al., Appl. Phys. Lett. 86, 252101 (2005).
2T. Hitosugi et al., Jpn. J. Appl. Phys. 44, L1063 (2005).