AVS 54th International Symposium
    Plasma Science and Technology Monday Sessions

Session PS1-MoM
Plasma Modeling

Monday, October 15, 2007, 8:00 am, Room 606
Moderator: C.C. Hsu, University of California at Los Angeles


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  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

8:00am PS1-MoM1
Mechanisms of Surface Roughness Formation and Evolution during Plasma Etching
G. Kokkoris, V. Constantoudis, G. Boulousis, P. Angelikopoulos, E. Gogolides, NSCR Demokritos, Greece
8:20am PS1-MoM2
Molecular Dynamics Simulation of Hydrogen Induced Damage to Si and SiO2 Substrates during Reactive Ion Etching (RIE) Processes
T. Takizawa, Osaka University, Japan, S. Kobayashi, T. Tatsumi, Sony Corp., Japan, S. Hamagushi, Osaka University, Japan
8:40am PS1-MoM3 Invited Paper
Vertically Integrated Computer Aided Design for Devices Process
T. Makabe, Keio University, Japan
9:20am PS1-MoM5
Ion Energy and Angular Distributions into Small Features in Plasma Etching Reactors: The Wafer- Focus Ring Gap
N.Y. Babaeva, M.J. Kushner, Iowa State University
9:40am PS1-MoM6
Effect of Dual Frequency Bias on Ion Energy and Angular Distribution and Feature Profile in a Capacitively Coupled Plasma Reactor
K. Bera, S. Rauf, K. Collins, Applied Materials, Inc.
10:20am PS1-MoM8
Modeling of a Dual-Coil and Dual-Flow Inductively Coupled Plasma Reactor
C.C. Hsu, V. Le, J.P. Chang, University of California at Los Angeles
10:40am PS1-MoM9
Prediction of Feature Profile Evolution of Deep Si Etching under Effect of Plasma Molding in 2f-CCP in SF6/O2
F. Hamaoka, T.Y. Yagisawa, T. Makabe, Keio University, Japan
11:00am PS1-MoM10
Prediction of Feature Profile Evolution in Shallow Trench Isolation Etching
J. Hoang, C.C. Hsu, J.P. Chang, University of California at Los Angeles
11:20am PS1-MoM11
Investigation of Source and Bias Pulsing for High Aspect Ratio Silicon Etching
G. Wenig, A. Kersch, W. Jacobs, S. Barth, A. Henke, J. Sobe, A. Steinbach, S. Wege, Qimonda, Germany, M. Reinicke, Dresden University of Technology, Germany
11:40am PS1-MoM12
Global Plasma Simulations using Dynamically Generated Chemical Models
J.J. Munro, J. Tennyson, University College London, England