AVS 54th International Symposium | |
Plasma Science and Technology | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
8:00am | PS1-MoM1 Mechanisms of Surface Roughness Formation and Evolution during Plasma Etching G. Kokkoris, V. Constantoudis, G. Boulousis, P. Angelikopoulos, E. Gogolides, NSCR Demokritos, Greece |
8:20am | PS1-MoM2 Molecular Dynamics Simulation of Hydrogen Induced Damage to Si and SiO2 Substrates during Reactive Ion Etching (RIE) Processes T. Takizawa, Osaka University, Japan, S. Kobayashi, T. Tatsumi, Sony Corp., Japan, S. Hamagushi, Osaka University, Japan |
8:40am | PS1-MoM3 Invited Paper Vertically Integrated Computer Aided Design for Devices Process T. Makabe, Keio University, Japan |
9:20am | PS1-MoM5 Ion Energy and Angular Distributions into Small Features in Plasma Etching Reactors: The Wafer- Focus Ring Gap N.Y. Babaeva, M.J. Kushner, Iowa State University |
9:40am | PS1-MoM6 Effect of Dual Frequency Bias on Ion Energy and Angular Distribution and Feature Profile in a Capacitively Coupled Plasma Reactor K. Bera, S. Rauf, K. Collins, Applied Materials, Inc. |
10:20am | PS1-MoM8 Modeling of a Dual-Coil and Dual-Flow Inductively Coupled Plasma Reactor C.C. Hsu, V. Le, J.P. Chang, University of California at Los Angeles |
10:40am | PS1-MoM9 Prediction of Feature Profile Evolution of Deep Si Etching under Effect of Plasma Molding in 2f-CCP in SF6/O2 F. Hamaoka, T.Y. Yagisawa, T. Makabe, Keio University, Japan |
11:00am | PS1-MoM10 Prediction of Feature Profile Evolution in Shallow Trench Isolation Etching J. Hoang, C.C. Hsu, J.P. Chang, University of California at Los Angeles |
11:20am | PS1-MoM11 Investigation of Source and Bias Pulsing for High Aspect Ratio Silicon Etching G. Wenig, A. Kersch, W. Jacobs, S. Barth, A. Henke, J. Sobe, A. Steinbach, S. Wege, Qimonda, Germany, M. Reinicke, Dresden University of Technology, Germany |
11:40am | PS1-MoM12 Global Plasma Simulations using Dynamically Generated Chemical Models J.J. Munro, J. Tennyson, University College London, England |