| AVS 54th International Symposium | |
| Applied Surface Science | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | AS-MoM1 Invited Paper Quantitative Surface Analysis - Applying Thirty Years of Progress and Addressing New Analysis Needs D.R. Baer, Pacific Northwest National Laboratory |
| 8:40am | AS-MoM3 Invited Paper Some Highlights and New Directions in Quantitative AES and XPS C.J. Powell, National Institute of Standards and Technology |
| 9:20am | AS-MoM5 The Bulk Ratio Method for Determining Surface Enhancement Using Auger Analysis J.D. Geller, Geller MicroAnalytical Laboratory, Inc. |
| 9:40am | AS-MoM6 Investigation of Average Matrix Relative Sensitivity Factors in Auger Electron Spectroscopy M. Suzuki, K. Mamiya, N. Urushihara, N. Sanada, ULVAC-PHI, Inc., Japan, D.F. Paul, S. Bryan, Physical Electronics |
| 10:20am | AS-MoM8 Invited Paper Quantitative Surface Chemical Microscopy J. Walton, The University of Manchester, UK |
| 11:00am | AS-MoM10 Quantitative Characterization of Nb SRF Accelerator Cavity Surfaces Based on the Work of Seah and Powell M.J. Kelley, H. Tian, College of William & Mary, C.E. Reece, Thomas Jefferson National Accelerator Facility |
| 11:20am | AS-MoM11 Formation of Ultra Thin Oxide Free Protective Coatings on Chromium and 316 L Stainless Steel from Etidronic Acid S.L. Johnson, P.M.A. Sherwood, Oklahoma State University |
| 11:40am | AS-MoM12 X-ray Photoemission Analysis of Chemically Treated CdZnTe Semiconductor Surfaces A.J. Nelson, A.M. Conway, R.A. Bliss, C Evans, J.L. Ferreira, R.J. Nikolic, S.A. Payne, Lawrence Livermore National Laboratory |