|AVS 54th International Symposium|
|Plasma Science and Technology||Tuesday Sessions|
|Session:||Plasma Enhanced Atomic Layer Deposition and Plasma Deposition|
|Presenter:||F. Massines, CNRS PROMES, France|
|Authors:||F. Massines, CNRS PROMES, France
N. Gherardi, LAPLACE CNRS-UPS-INP, France
|Correspondent:||Click to Email|
The development of a PECVD process working at atmospheric pressure and allowing an easy on-line treatment of silicon wafer, glass plate or polymer film is a challenge of great interest. The successful solution will avoid batch treatments and significantly reduce the cost of the coating. The main questions to be solved are how to get a well controlled thin film in terms of chemical composition, structure and thickness? and how to get a high growth rate? Previous to the process development, the main difficulties concern the plasma homogeneity, the gas injection over large dimensions, the control of the atmosphere in the plasma area while the substrate is moving and the efficiency of the transfer of the reactive species to the surface taking into account the very low diffusion of the neutral radicals at atmospheric pressure. In case of two dimensional materials like, dielectric barrier discharge (DBD) appears like the more suitable discharge: it is cold, robust and not disturbed by the movement of the substrate. As example DBD generate the plasma of corona treaters useful for surface activation. However, making a thin film coating having well controlled and uniform properties is more delicate. Homogeneous DBD (HDBD) is a solution to reach that goal. Conditions to get such a HDBD are now widely known and easy to up-scale in one direction allowing to get a uniform plasma band of several meters in the direction perpendicular to that of the substrate movement. This solution is in competition with remote plasmas but knowing that the quenching of excited state drastically increases with the pressure, and as far as the substrate can be moved inside the discharge without inducing perturbation, remote plasma has to be avoid. At atmospheric pressure, the reactive gases leading to the coating formation are diluted in a main gas, which is usually helium, argon or nitrogen. The main gas determines the discharge regime and then the energetic species created during the plasma development. In nitrogen, the HDBD is a Townsend discharge while in noble gases the HDBD is a glow one. In this presentation results concerning SiOx coatings obtained from SiH4 or hexamethyldisiloxane mixed with N2O and diluted in N2 will be compared. The coating thickness, the refractive index and the chemical composition as a function of the gas residence time will be discussed and correlated to the main growth mechanism.