| AVS 54th International Symposium | |
| Plasma Science and Technology | Friday Sessions |
| Session PS-FrM |
| Session: | Plasma-Surface Interactions III |
| Presenter: | M. Dhayal, National Physics Laboratory, India |
| Authors: | M. Dhayal, National Physics Laboratory, India H.B. Gu, Chonnam National University, Korea K.H. Park, Chonnam National University, Korea |
| Correspondent: | Click to Email |
Plasma surface modification and weak acid treatments of nanocrystalline TiO2 has been carried out to improve efficiency of dye sensitized solar cells (DSSC). The argon ions in low pressure gas discharge can modify the TiO2 surface chemistry and had increased in the proportion of Ti3+ surface states. The proportion of different surface functionalities such as alcohol/ether (C-OX), carbonyl (C=O) and C(=O)OX were also significantly changed. Similarly the acid treatment of TiO2 had also change the surface chemistry. In this study the relative change in the surface chemistry with these two different methods has been discussed. These treatments have advantages for the adsorption to dye molecules and enhancement of the photoelectric performance of DSSC. The improvement in the energy conversion efficiency of dye-sensitized solar cells (DSSCs) with controlled surface states had been investigated.