| AVS 66th International Symposium & Exhibition | |
| Nanometer-scale Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 2:20pm | NS-ThA1 Invited Paper Interatomic Force Laws That Evade Dynamic Measurement John Sader, University of Melbourne, Australia |
| 3:00pm | NS-ThA3 Invited Paper Intermittent Contact Resonance Atomic Force Microscopy (icr-Afm) for Nanoscale Mechanical Property Characterization Gheorghe Stan, National Institute of Standards and Technology |
| 4:00pm | NS-ThA6 Novel Approaches Towards Cantilevers for Functional Multiparametric AFM Characterization Georg Ernest Fantner, N. Hosseini, M. Neuenschwander, B. Ghadiani, École Polytechnique Fédéral de Lausanne, Switzerland |
| 4:20pm | NS-ThA7 Fluid Handling using Scanning Probe Lithography for Nanocombinatorics V. Saygin, N. Alsharif, Keith A. Brown, Boston University |
| 4:40pm | NS-ThA8 Accuracy of Tip-sample Interaction Measurements Using Dynamic Atomic Force Microscopy Techniques O.E. Dagdeviren, Udo D. Schwarz, Yale University |
| 5:00pm | NS-ThA9 Utilizing AFM to Study the Effect of Malaria-derived EVs on the Mechanical and Morphological Properties of Red Blood Cells Irit Rosenhek-Goldian, E. Dekel, Y. Ohana, S. Maihib, S.R. Cohen, N. Regev-Rudzkib, Weizmann Institute of Science, Israel |
| 5:20pm | NS-ThA10 Invited Paper Silicon Oxide for RRAM Application: The SPM Analysis Approach Adnan Mehonic, M. Buckwell, W.H. Ng, A.J. Kenyon, University College London, UK |