AVS 66th International Symposium & Exhibition | |
Thin Films Division | Monday Sessions |
Session TF-MoM |
Session: | Thin Films for Electrochemistry and Energy Storage |
Presenter: | Daniel Loeffler, BASF Se, Germany |
Authors: | F. Rosowski, BASF Se, Germany D. Loeffler, BASF Se, Germany |
Correspondent: | Click to Email |
Atomic Layer Deposition is mainly applied in microelectronics as a thin film deposition technique. In academic research, ALD is also applied for synthesis of battery materials and catalysts. The main challenge for ALD in these research fields is the morphology of the substrate materials, usually small particles with high specific surface areas, e.g. up to 1000 m2/g for zeolites. Catalytic reactors can hold packed beds of several cubic meters of catalyst. The high specific surface areas and the amounts in which such catalysts are needed require safe and efficient ways of dosing ALD precursors without bypass and waste. And while mass and heat transport limitations play only a minor role in the case of flat substrates, these phenomena need to be considered when coating large amounts of powder.
At BasCat, ALD is used in several projects to synthesize and modify catalysts. Some research is done along well-established lines of work in the field of supported metal catalysts, e.g. modifying supported metal catalysts with metal oxide layers, but the focus lies on catalysts used for selective oxidation reactions, typically consisting of mixed metal oxides or phosphates. Catalysts are usually prepared in two batch sizes. For establishing suitable ALD process conditions, a sample size of about 1 cm3 is used. In a second step, catalyst amounts of 10–25 cm3 are prepared. It is important that process conditions established on the small scale are easily transferrable to the large scale.
For this purpose, a new and unique test facility was installed at BasCat equipped with a thermogravimetric balance as analytical small scale ALD reactor and a second reactor for catalyst synthesis on a large scale via ALD.[1] Based on our first ALD results, a fixed bed was chosen as reactor geometry for the analytical reactor and the synthesis reactor.
In order to check the feasibility of our new in situ method and the ALD performance of our fixed bed reactor, first studies covered the deposition of alumina on a typical catalyst support, a silica with high surface area (Davisil 636). It was shown that the fixed bed geometry is suitable for ALD, that the substrate is homogeneously covered, and that scaling-up from 1 cm3 to 10 cm3 is possible.[2]
The combination of analytical reactor and synthesis reactor was then successfully used for modifying supported metal catalysts with layers of alumina, alucone, and zinc oxide. Other works included the deposition of rhenium on silver and phosphorus on vanadia.[3]
[1] Strempel et al., Rev. Sci. Instrum., 074102. 2017
[2] Strempel et al., F.,Nanomaterials, 365. 2018
[3] Strempelet al., J. Vac. Sci. Technol. A Vacuum, Surfaces, Film., 01A135. 2016