AVS 66th International Symposium & Exhibition | |
New Challenges to Reproducible Data and Analysis Focus Topic | Wednesday Sessions |
Session RA+AS+BI-WeA |
Session: | Addressing Reproducibility Challenges using Multi-Technique Approaches |
Presenter: | Maiglid Andreina Moreno Villavicencio, CEA-LETI, France |
Authors: | M.A. Moreno Villavicencio, CEA-LETI, France N. Chevalier, CEA-LETI, France J.-P. Barnes, CEA-LETI, France P. Kermagoret, ST Microelectronics, France F. Lorut, ST Microelectronics, France B. Gautier, Université de Lyon, France |
Correspondent: | Click to Email |
A ToF-SIMS / AFM methodology that combine the topographical information with the chemical composition has been established [1]. It was used to achieve a topography-corrected 3D ToF-SIMS data set and maps of local sputter rate where the effect of roughness and vertical interfaces are seen. However, the correlation of these characterization techniques is not limited to these applications. Indeed, by using advanced operation modes of the AFM, maps of diverse physical properties of the sample can be obtained at the same time as the topography.
We have explored the combination of ToF-SIMS analysis with three AFM advanced modes: piezoresponse force microcopy (PFM), scanning capacitance microscopy (SCM) and scanning spreading resistance microscopy (SSRM). These operation modes respectively allow to map ferroelectric domains, to locally measure capacitance variations and to image the sample surface resistivity.
The combined ToF-SIMS / AFM methodology was applied ex-situ per individual AFM mode on diverse samples for applications focused on micro-electronics. We will present here some promising results highlighting the strength and the perspectives of the expansion of this combination to other applications.
[1] M.A. Moreno et al, J. Vac. Sci. Technol. B 36 (2018) 03F122.