| AVS 66th International Symposium & Exhibition | |
| MEMS and NEMS Group | Tuesday Sessions |
| Session MN-TuM |
| Session: | MEMS, BioMEMS, and MEMS for Energy: Processes, Materials, and Devices II |
| Presenter: | Mark Ming-Cheng Cheng, Wayne State University |
| Authors: | M.M.C. Cheng, Wayne State University G. Chen, Wayne State University |
| Correspondent: | Click to Email |
We report corrosion-resistant and high-capacity implantable nanoporous titanium nitride (TiN) electrodes for neural probes applications Traditionally, the TiN electrodes are prepared using reactive sputtering techniques and have limited surface areas. To research smaller electrodes to minimize tissue damage, high aspect ratio TiN nanotube structures were fabricated using electrochemical anodization of Ti wires followed by high-temperature nitration. The specific charge capacity of nanoporous TiN correlates proportional with the surface area and pore size.
According to Shannon criteria, an empirical rule in neural engineering for possibility of tissue damage from electrical stimulation, the recommended limit density of a stimulation pulse is 30μCcm-2for a geometric surface area of 0.06cm2. Nevertheless, the charge injection capacity of chronically implanted electrodes has shown degraded over the time (within one month to a year), including sputtered iridium oxide (SIROF), porous platinum and tungsten. One of the challenges for these implantable electrodes involves irreversible reduction and oxidation reactions occurring at the electrode surface through faradic or pseudocapacitive charge transfer. On the other hand, TiN has different mechanism of charge injection (through capacitive double layers). TiN has been shown promising electrode material in neural implants thanks to its super electrical conductivity, biocompatibility and chemical stability. TiN is also known for physiologically inert and corrosion resistant. To increase the spatial resolution of neural stimulation, small electrodes with high surface areas are more desirable. To the best of our knowledge, TiN nanotubes electrodes have not been studied in the literature for neural implants. Compared to tungsten electrode, the impedance and morphology of nanoporous TiN was found stable over a long-term in stress tests (at an elevated temperatures in phosphorous buffered solution).