AVS 66th International Symposium & Exhibition
    Electronic Materials and Photonics Division Wednesday Sessions
       Session EM+2D+AS+MI+MN+NS+TF-WeM

Paper EM+2D+AS+MI+MN+NS+TF-WeM13
Reference Materials for Localization Microscopy

Wednesday, October 23, 2019, 12:00 pm, Room A214

Session: Nanostructures and Nanocharacterization of Electronic and Photonic Devices
Presenter: Samuel Stavis, National Institute for Science and Technology (NIST)
Authors: C.R. Copeland, National Institute for Science and Technology (NIST)
R.G. Dixson, National Institute for Science and Technology (NIST)
L.C.C. Elliott, National Institute for Science and Technology (NIST)
B.R. Ilic, National Institute for Science and Technology (NIST)
D. Kozak, FDA, National Institute for Science and Technology (NIST)
K.-T. Liao, FDA, National Institute for Science and Technology (NIST)
J.A. Liddle, NIST Center for Nanoscale Science and Technology
A.C. Madison, National Institute for Science and Technology (NIST)
J.-H. Myung, FDA
A. Pintar, National Institute for Science and Technology (NIST)
S.M. Stavis, National Institute for Science and Technology (NIST)
Correspondent: Click to Email
As the diffraction limit fades away into the history of optical microscopy, new challenges are emerging in super-resolution measurements of diverse systems ranging from catalysts to therapeutics. In particular, due to common limitations of reference materials and microscope calibrations, many localization measurements are precise but not accurate. This can result in gross overconfidence in measurement results with statistical uncertainties that are apparently impressive but potentially meaningless, due to the unknown presence of systematic errors that are orders of magnitude larger. To solve this fundamental problem in measurement science, we are optimizing and applying nanofabrication processes to develop reference materials for localization microscopy, and demonstrating their use in quantitative methods of microscope calibration.

Our program consists of two complementary approaches. In the first, involving applied metrology, we are developing reference materials such as aperture arrays that can serve as standalone artifacts for widespread deployment. This approach will require the application of critical-dimension metrology to establish the traceability of master artifacts, and their use to calibrate a super-resolution microscope for high-throughput characterization of economical batches of reference materials. In the second approach, involving fundamental research, we are demonstrating the application of reference materials and calibration methods in our own experimental measurements. Most interestingly, achieving vertical integration of our two approaches and the unique capabilities that result, we are building reference materials into measurement devices for in situ calibration of localization measurements for nanoparticle characterization.

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