AVS 66th International Symposium & Exhibition
    Applied Surface Science Division Thursday Sessions
       Session AS-ThM

Paper AS-ThM5
Variation of SIMS Secondary Ion Yield of Si and Mg Dopants in GaN Grown by MOCVD

Thursday, October 24, 2019, 9:20 am, Room A211

Session: Advances in Depth Profiling, Imaging and Time-resolved Analysis
Presenter: M. K. Indika Senevirathna, Clark Atlanta University
Authors: M.K.I. Senevirathna, Clark Atlanta University
A.Y. Kozhanov, Georgia State University
M. Vernon, Georgia State University
G.B. Cross, Georgia State University
G. Cooke, Hiden Analytical Ltd, UK
M.D. Williams, Clark Atlanta University
Correspondent: Click to Email

We present a study of the secondary ion yield of silicon and magnesium dopant species as a function of the primary ion beam energy in n-doped and p-doped gallium nitride, respectively. The epilayers were grown by metal organic chemical vapor deposition and depth profiled using a Hiden quadrupole secondary ion mass spectrometer. To our knowledge, this is the first such study for this matrix material system. The yields for oxygen and cesium primary beams were determined by varying the beam acceleration voltage of the primary ion beam from 0.5 kV to 5 kV at a fixed beam current. The results determine the primary beam energies for optimal species sensitivity.