AVS 66th International Symposium & Exhibition
    Applied Surface Science Division Thursday Sessions
       Session AS-ThM

Paper AS-ThM3
TOF-SIMS Tandem MS Imaging of (Sub-)Monolayer Coatings for Device Processing

Thursday, October 24, 2019, 8:40 am, Room A211

Session: Advances in Depth Profiling, Imaging and Time-resolved Analysis
Presenter: David M. Carr, Physical Electronics
Authors: D.M. Carr, Physical Electronics
G.L. Fisher, Physical Electronics
Correspondent: Click to Email

One common objective in research, failure analysis and reverse engineering is to ascertain the 2D/3D composition and structure of molecules in devices as a result of various processing steps. Often there is insufficient background information and a lack of reference spectra to properly interpret the analytical observations. Two device processing case studies will be presented highlighting the benefits of adding MS/MS imaging to conventional TOF-SIMS experiments. The data was acquired on a PHI nanoTOF II designed for simultaneous TOF-SIMS (MS1) imaging and tandem MS (MS2) imaging [1-4].

In the first case study, a carbon residue was observed by Auger electron spectroscopy (AES) imaging on e- beam lithography-patterned and etched device structures. TOF-SIMS tandem MS imaging was applied to characterize the composition and structure of the sub-monolayer residues. In the second case study, functionalized molecules containing bipyridine and triphenylphosphine ligands were patterned by a photolithography method and loaded with metals including Au, Pd and Pt [5]. TOF-SIMS tandem MS imaging was employed to confirm the presence and elucidate the structure of metal-organic ligands.

References

[1] G.L. Fisher, et al, Anal. Chem. 88 (2016) 6433-6440.

[2] G.L. Fisher, et al, Microscop. Microanal. 23 (2017) 843-848.

[3] C.E. Chini, et al, Biointerphases13 (2018) 03B409.

[4] T. Fu, et al, Nature Sci. Rep. (2018) accepted 06 December 2018.

[5] R. Müller and A. Welle at Karlsruhe Institute of Technology (KIT) and C. Barner-Kowollik at Queensland University of Technology (QUB) are acknowledged for providing the samples for analysis.