| AVS 65th International Symposium & Exhibition | |
| Thin Films Division | Monday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:20am | TF1-MoM1 Monitoring the Transient Surface Species during TiO2 Atomic Layer Deposition using Surface-Enhanced Raman Spectroscopy Ryan Hackler, G. Kang, G.C. Schatz, P.C. Stair, R.P. Van Duyne, Northwestern University |
| 8:40am | TF1-MoM2 Theoretical Study on the Effect of Precursor Ligand in Atomic Layer Deposition of Al2O3 on SiO2 Tania Sandoval, Universidad Técnica Federico Santa María, T-L. Liu, Stanford University, R. Tonner, Philipps-Universität Marburg, S.F. Bent, Stanford University |
| 9:00am | TF1-MoM3 Relevance of Dimeric and Tetrameric Structures to the Surface Chemistry of Metal Amidinate Atomic Layer Deposition Precursors Bo Chen, Y. Yao, Q. Ma, F. Zaera, University of California, Riverside, Y. Duan, A.V. Teplyakov, University of Delaware, J. Coyle, S. Barry, Carleton University |
| 9:20am | TF1-MoM4 Low Temperature Dielectric ALD with the use of Hydrogen Peroxide: Comparison of Growth and Film Characteristics for Anhydrous H2O2, H2O2/H2O Mixtures and H2O Daniel Alvarez, K. Andachi, J. Spiegelman, RASIRC |
| 9:40am | TF1-MoM5 Invited Paper Putting More Chemistry into CVD. Precursors, Superconformality, and Selectivity Gregory Girolami, J.R. Abelson, University of Illinois at Urbana-Champaign |
| 10:40am | TF1-MoM8 Insight into the "Residual Methyls" during ALD of Al2O3 from TMA/H2O using in situ RAIRS Brent Sperling, B. Kalanyan, J.E. Maslar, National Institute of Sandards and Technology (NIST) |
| 11:00am | TF1-MoM9 Low Temperature Atomic Layer Deposition of Silicon Nitride using Hexachlorodisilane and Ultra-High Purity Hydrazine Aswin Kondusamy, A.T. Lucero, S. Hwang, X. Meng, H.S. Kim, University of Texas at Dallas, D. Alvarez Jr., J. Spiegelman, RASIRC, J. Kim, University of Texas at Dallas |
| 11:20am | TF1-MoM10 Investigating Low-Temperature Atomic Layer Deposition of Nickel Oxide using Ni(tBu2DAD)2 and Ozone Konner Holden, J.F. Conley, Jr., Oregon State University, C.L. Dezelah, EMD Performance Materials |