| AVS 65th International Symposium & Exhibition | |
| Thin Films Division | Monday Sessions |
| Session TF1-MoM |
| Session: | Precursors and Surface Reactions |
| Presenter: | Gregory Girolami, University of Illinois at Urbana-Champaign |
| Authors: | G.S. Girolami, University of Illinois at Urbana-Champaign J.R. Abelson, University of Illinois at Urbana-Champaign |
| Correspondent: | Click to Email |
This talk will cover recent work on the synthesis of new CVD precursors for transition metals that combine air stability with good shelf life and high volatility, and studies of the mechanism by which they thermolyze. We will also describe our efforts over the last few years to develop new kinds of CVD methods that are able to deposit films both conformally and superconformally, as well as selectively on some surfaces but not on others. Our approach has been to think like chemists and to use kinetic concepts such as inhibition, differential diffusion, and rate laws to invent new methods to control film thickness as a function of depth. A variety of specific examples of our new approaches will be illustrated.