| AVS 65th International Symposium & Exhibition | |
| Plasma Science and Technology Division | Thursday Sessions |
Click a paper to see the details. Presenters are shown in bold type.
| 8:00am | PS-ThM1 Model of a Radio-Frequency Low Electron Temperature Plasma Source Shahid Rauf, L. Dorf, K.S. Collins, Applied Materials |
| 8:20am | PS-ThM2 Electron-beam Sustained Plasma with Unique Characteristic of Low Electron Temperature at Very Low Pressure Zhiying Chen, Tokyo Electron America, Inc., K. Nagaseki, Tokyo Electron Miyagi, Ltd., Japan, J. Blakeney, M. Doppel, P.L.G. Ventzek, Tokyo Electron America, Inc., A. Ranjan, TEL Technology Center, America, LLC. |
| 8:40am | PS-ThM3 Invited Paper Hydrid Plasma Source with Inductive and Capacitive Fields: Fundamental Understanding and Nano-applications Hyo-Chang Lee, Korea Research Institute of Standards and Science (KRISS) |
| 9:20am | PS-ThM5 Improving RF Power Delivery for Pulsed Operation J. Brandon, C. Smith, K. Ford, North Carolina State University, S.K. Nam, Samsung Electronics, Steven Shannon, North Carolina State University |
| 9:40am | PS-ThM6 Optimizing Transients Using Low-High Pulsed Power in Inductively Coupled Plasmas Chenhui Qu, S.J. Lanham, University of Michigan, T. Ma, T. List, P. Arora, V.M. Donnelly, University of Houston, M.J. Kushner, University of Michigan |
| 11:00am | PS-ThM10 Silicon Nitride Film Formations Using Magnetic-Mirror Confined New Plasma Source Tetsuya Goto, Tohoku University, Japan, S.K. Kobayashi, Kotec Company, Ltd., Japan, S. Sugawa, Tohoku University, Japan |
| 11:20am | PS-ThM11 Resonant Element Microwave Plasma Source Barton Lane, P.L.G. Ventzek, A. Bhakta, Tokyo Electron, America, Inc., K. Nagaseki, Tokyo Electron Miyagi, Ltd., A. Ranjan, Tokyo Technology Center America |
| 11:40am | PS-ThM12 Invited Paper Microwave Plasma Enabling Efficient Power-To-X Conversion Gerard van Rooij, DIFFER, The Netherlands |