AVS 65th International Symposium & Exhibition
    Electronic Materials and Photonics Division Monday Sessions

Session EM+AM+NS+PS-MoA
Atomic Layer Processing: Selective-Area Patterning (Assembly/Deposition/Etching)

Monday, October 22, 2018, 1:20 pm, Room 101A
Moderators: Michael Filler, Georgia Institute of Technology, Jessica Hilton, RHK Technology


  Click here to Download program book for this session  
  in Adobe Acrobat format  

Click a paper to see the details. Presenters are shown in bold type.

1:20pm EM+AM+NS+PS-MoA1
Area-Selective Deposition of Crystalline Perovskites
E. Lin, Brennan Coffey, Z. Zhang, P.Y. Chen, B. Edmondson, J.G. Ekerdt, University of Texas at Austin
1:40pm EM+AM+NS+PS-MoA2
A Dry NF3/NH3 Plasma Clean for Removing Si Native Oxide and Leaving a Smooth Si Surface
Christopher Ahles, J.Y. Choi, University of California, San Diego, A.C. Kummel, University of California at San Diego
2:00pm EM+AM+NS+PS-MoA3 Invited Paper
Probing Strategies for Selective Deposition that Exploit Competitive Interactions
James Engstrom, Cornell University
2:40pm EM+AM+NS+PS-MoA5
The Interconnect Resistivity Bottleneck
Daniel Gall, T. Zhou, E. Milosevic, Rensselaer Polytechnic Institute, P.Y. Zheng, Micron Technology
3:00pm EM+AM+NS+PS-MoA6
Sub 0.3 micrometer Copper Patterns Etched with a Plasma-Based Process and Pattern Dependent Electromigration Failure Mechanism
Yue Kuo, Texas A&M University
3:40pm EM+AM+NS+PS-MoA8 Invited Paper
The Effect of Metal Diffusion on Contacts to Semiconducting Chalcogenides: Examples for 2D and 3D Materials
Suzanne E. Mohney, K.A. Cooley, M. Abraham, A.C. Domask, H. Simchi, L. Kerstetter, C. Lawrence, T.N. Walter, The Pennsylvania State University
4:20pm EM+AM+NS+PS-MoA10
TiNx and TaNx Films via Low-T Thermal ALD using Anhydrous N2H4
Steven Wolf, M. Breeden, M. Kavrik, University of California at San Diego, D. Alvarez, J. Spiegelman, RASIRC, M. Naik, Applied Materials, A.C. Kummel, University of California at San Diego