Invited Paper TF+EM+MI+PS-MoA5
Tuning of the Magnetic and Electronic Properties of Epitaxial Heusler Compound Heterostructures
Monday, October 22, 2018, 2:40 pm, Room 102A
Heusler compounds have received a lot of attention because of their large range of properties. Their properties depend on the number of valence electrons per formula unit and have been predicted to be semiconductors, metals, ferromagnets, antiferromagnets, half metals, superconductors and topological insulators. Similar to compound semiconductors, the band structure and lattice parameters of Heusler alloys can also be tuned through alloying but over a much larger range of properties. Magnetic tunnel junctions using Heusler alloys that are predicted to be half metals have shown record tunneling magnetoresistance. Heusler half metals have been predicted to have very low Gilbert damping coefficients. They can also be lattice matched to most compound semiconductors and have been used for spin injecting contacts. Recent theoretical predictions suggest that atomic level Heusler superlattices can result in half metallicity and perpendicular magnetization. This presentation will emphasize the molecular beam epitaxial growth combined with in-situ and ex-situ structural, electronic and magnetic characterization of Heusler heterostructures on III-V semiconductors and MgO single crystal substrates. Tuning of their magnetic and electronic properties through elemental substitution to change the number of valence electrons per formula unit and atomic level superlattice growth will be discussed. Examples of Heusler heterostructures and controlling of their magnetic and electronic properties include tuning of the spin polarization in Co2Mn1-xFexSi, Heusler contacts for spin injection into GaAs, spin polarization and magnetic anisotropy of Co2MnAl/Fe2MnAl atomic scale superlattices, substitution with Fe in CoTiSb with the aim to convert a semiconductor to half metal and interfacial reactions at Co2MnSi/MgO interfaces. By careful tuning of the half metallic Heusler film composition, Gilbert damping coefficients <0.001 have been observed.